Abstract
Local high current densities in areas around dislocations with a screw component might be responsible for the observed high leakage currents in GaN-based electronic devices. Using ballistic electron emission microscopy, threading dislocations with a screw component are found to be accompanied by high current densities and low effective Schottky barrier heights. The electronic states responsible for this extremely nonuniform behavior of GaN films are metastable trap states. The experimental results show that acceptor- and donor-like charge traps coexist in the vicinity of dislocations with a screw component.
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Dates
Type | When |
---|---|
Created | 23 years ago (July 26, 2002, 9:36 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 3, 2024, 11:01 a.m.) |
Indexed | 4 months ago (April 21, 2025, 12:43 a.m.) |
Issued | 26 years, 4 months ago (April 19, 1999) |
Published | 26 years, 4 months ago (April 19, 1999) |
Published Print | 26 years, 4 months ago (April 19, 1999) |
@article{Brazel_1999, title={Direct observation of localized high current densities in GaN films}, volume={74}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.123853}, DOI={10.1063/1.123853}, number={16}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Brazel, E. G. and Chin, M. A. and Narayanamurti, V.}, year={1999}, month=apr, pages={2367–2369} }