Abstract
We present a dual-frequency electromagnetic scanning probe and apply it for quantitative mapping of the sheet resistance of conducting films. The high-frequency (82 GHz) mode is used for image acquisition, while the low-frequency (5 MHz) mode is used for distance control. We measure magnitude and phase of the near-field microwave reflectivity from conducting films of varying thickness and develop a model which accounts fairly well for our results. This brings us to a quantitative understanding of the contrast in the microwave near-field imaging using an aperture probe, and allows us to achieve quantitative contactless characterization of conducting layers with sheet resistance even below 2 Ω.
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Dates
Type | When |
---|---|
Created | 23 years ago (July 26, 2002, 9:31 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 3, 2024, 10:15 a.m.) |
Indexed | 2 months, 4 weeks ago (May 26, 2025, 9:44 a.m.) |
Issued | 26 years, 9 months ago (Nov. 9, 1998) |
Published | 26 years, 9 months ago (Nov. 9, 1998) |
Published Print | 26 years, 9 months ago (Nov. 9, 1998) |
@article{Lann_1998, title={Combined millimeter-wave near-field microscope and capacitance distance control for the quantitative mapping of sheet resistance of conducting layers}, volume={73}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.122605}, DOI={10.1063/1.122605}, number={19}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Lann, A. F. and Golosovsky, M. and Davidov, D. and Frenkel, A.}, year={1998}, month=nov, pages={2832–2834} }