Abstract
The diffusion of Ga and N adatoms has been studied for the technologically relevant wurtzite (0001̄) and (0001) surfaces employing density-functional theory. Our calculations reveal a very different diffusivity for Ga and N adatoms on the equilibrium surfaces: While Ga is very mobile at typical growth temperatures, the diffusion of N is by orders of magnitude slower. These results give a very detailed insight of how and under which growth conditions N adatoms can be stabilized and efficiently incorporated at the surface. We further find that the presence of excess N strongly increases the Ga diffusion barrier and discuss the consequences for the growth of GaN.
References
15
Referenced
429
10.1063/1.111832
/ Appl. Phys. Lett. (1994)10.1063/1.118300
/ Appl. Phys. Lett. (1997)10.1063/1.365575
/ J. Appl. Phys. (1997)10.1063/1.116474
/ Appl. Phys. Lett. (1996){'key': '2024020314414934500_r5'}
10.1557/S109257830000171X
/ MRS Internet J. Nitride Semicond. Res. (1997)10.1063/1.357479
/ J. Appl. Phys. (1994){'key': '2024020314414934500_r8'}
{'key': '2024020314414934500_r9'}
10.1016/0010-4655(94)90187-2
/ Comput. Phys. Commun. (1994)10.1557/PROC-408-43
/ Mater. Res. Soc. Symp. Proc. (1995){'key': '2024020314414934500_r12'}
10.1103/PhysRevLett.79.3934
/ Phys. Rev. Lett. (1997)10.1103/PhysRevB.56.12
/ Phys. Rev. B (1997)10.1103/PhysRevLett.79.5278
/ Phys. Rev. Lett. (1997)
@article{Zywietz_1998, title={Adatom diffusion at GaN (0001) and (0001̄) surfaces}, volume={73}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.121909}, DOI={10.1063/1.121909}, number={4}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Zywietz, Tosja and Neugebauer, Jörg and Scheffler, Matthias}, year={1998}, month=jul, pages={487–489} }