Abstract
In situ Raman spectra of SiHx, Si–F, and Si–Si vibrations from Si surfaces in HF aqueous solutions are obtained using a highly sensitive confocal microprobe Raman system. Electrochemical roughening pretreatment and laser-assisted roughening procedure enable good quality surface Raman spectra to be obtained. The surface Raman and photoluminescence spectra from the Si surface in the etching environment and the correlation of the two types of spectra are discussed. The Raman spectroscopy is shown to have high potential in serving as an important tool for in situ investigating of Si surface bonding during the etching process.
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 9:43 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 3, 2024, 9:03 a.m.) |
Indexed | 1 year, 6 months ago (Feb. 3, 2024, 9:40 a.m.) |
Issued | 27 years, 6 months ago (Feb. 23, 1998) |
Published | 27 years, 6 months ago (Feb. 23, 1998) |
Published Print | 27 years, 6 months ago (Feb. 23, 1998) |
@article{Ren_1998, title={In situ monitoring of Raman scattering and photoluminescence from silicon surfaces in HF aqueous solutions}, volume={72}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.120877}, DOI={10.1063/1.120877}, number={8}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Ren, B. and Liu, F. M. and Xie, J. and Mao, B. W. and Zu, Y. B. and Tian, Z. Q.}, year={1998}, month=feb, pages={933–935} }