Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

A scanning near-field optical microscope (SNOM) has been constructed that is capable of recording Raman spectra with a spatial resolution of ∼150 nm. The SNOM has been used to produce a combined topological and Raman map of a plastically deformed area of a silicon wafer. The variation of the frequency of the 520 cm−1 Raman band with position has been used to estimate the residual stresses associated with the deformation. The measurements demonstrate the feasibility of nondestructive, submicron stress measurement in semiconductors by near-field Raman spectroscopy.

Bibliography

Webster, S., Batchelder, D. N., & Smith, D. A. (1998). Submicron resolution measurement of stress in silicon by near-field Raman spectroscopy. Applied Physics Letters, 72(12), 1478–1480.

Authors 3
  1. S. Webster (first)
  2. D. N. Batchelder (additional)
  3. D. A. Smith (additional)
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Dates
Type When
Created 23 years ago (July 26, 2002, 9:43 a.m.)
Deposited 1 year, 6 months ago (Feb. 3, 2024, 9:10 a.m.)
Indexed 3 days, 2 hours ago (Aug. 23, 2025, 12:58 a.m.)
Issued 27 years, 5 months ago (March 23, 1998)
Published 27 years, 5 months ago (March 23, 1998)
Published Print 27 years, 5 months ago (March 23, 1998)
Funders 0

None

@article{Webster_1998, title={Submicron resolution measurement of stress in silicon by near-field Raman spectroscopy}, volume={72}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.120598}, DOI={10.1063/1.120598}, number={12}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Webster, S. and Batchelder, D. N. and Smith, D. A.}, year={1998}, month=mar, pages={1478–1480} }