Abstract
A scanning near-field optical microscope (SNOM) has been constructed that is capable of recording Raman spectra with a spatial resolution of ∼150 nm. The SNOM has been used to produce a combined topological and Raman map of a plastically deformed area of a silicon wafer. The variation of the frequency of the 520 cm−1 Raman band with position has been used to estimate the residual stresses associated with the deformation. The measurements demonstrate the feasibility of nondestructive, submicron stress measurement in semiconductors by near-field Raman spectroscopy.
References
25
Referenced
98
10.1088/0268-1242/11/2/001
/ Semicond. Sci. Technol. (1996){'key': '2024020314095230900_r2', 'first-page': '7149', 'volume': '79', 'year': '1996', 'journal-title': 'J. Appl. Phys.'}
/ J. Appl. Phys. (1996)10.1116/1.579867
/ J. Vac. Sci. Technol. A (1995)10.1016/0038-1098(70)90588-0
/ Solid State Commun. (1970)10.1149/1.2086845
/ J. Electrochem. Soc. (1990)10.1063/1.339296
/ J. Appl. Phys. (1987)10.1016/0038-1101(80)90164-1
/ Solid-State Electron. (1980)10.1063/1.94865
/ Appl. Phys. Lett. (1984)10.1016/0304-3991(84)90201-8
/ Ultramicroscopy (1984)10.1126/science.257.5067.189
/ Science (1992)10.1016/0304-3991(95)00117-4
/ Ultramicroscopy (1995)10.1002/(SICI)1097-4555(199608)27:8<579::AID-JRS13>3.0.CO;2-4
/ J. Raman Spectrosc. (1996){'key': '2024020314095230900_r13', 'first-page': '29', 'volume': '251', 'year': '1991', 'journal-title': 'Science'}
/ Science (1991)10.1063/1.106940
/ Appl. Phys. Lett. (1992){'key': '2024020314095230900_r15'}
10.1103/PhysRevLett.60.2156
/ Phys. Rev. Lett. (1988)10.1038/357645a0
/ Nature (London) (1992)10.1063/1.364340
/ J. Appl. Phys. (1997)10.1063/1.327714
/ J. Appl. Phys. (1980)10.1063/1.363956
/ J. Appl. Phys. (1997)10.1063/1.366270
/ J. Appl. Phys. (1997)10.1063/1.1147073
/ Rev. Sci. Instrum. (1996)10.1063/1.329930
/ J. Appl. Phys. (1982)10.1364/AO.31.004563
/ Appl. Opt. (1992)10.1063/1.336848
/ J. Appl. Phys. (1986)
Dates
Type | When |
---|---|
Created | 23 years ago (July 26, 2002, 9:43 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 3, 2024, 9:10 a.m.) |
Indexed | 3 days, 2 hours ago (Aug. 23, 2025, 12:58 a.m.) |
Issued | 27 years, 5 months ago (March 23, 1998) |
Published | 27 years, 5 months ago (March 23, 1998) |
Published Print | 27 years, 5 months ago (March 23, 1998) |
@article{Webster_1998, title={Submicron resolution measurement of stress in silicon by near-field Raman spectroscopy}, volume={72}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.120598}, DOI={10.1063/1.120598}, number={12}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Webster, S. and Batchelder, D. N. and Smith, D. A.}, year={1998}, month=mar, pages={1478–1480} }