Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

Schottky-type light emitting devices have been fabricated on Er-oxide doped Si layers grown by molecular beam epitaxy, in order to study the light emission process of Er-doped Si structures. By applying a reverse bias on the Schottky junction, Er ions incorporated within the depletion layer can be electrically excited via a hot electron impact process. Rather intense electroluminescence (EL) at a wavelength of 1.54 μm has been observed at room temperature. The optoelectronic properties of the devices have been characterized by both input-power dependent and temperature dependent EL measurements. An activation energy value of ∼160 meV responsible for luminescence thermal quenching has been obtained.

Bibliography

Du, C.-X., Ni, W.-X., Joelsson, K. B., & Hansson, G. V. (1997). Room temperature 1.54 μm light emission of erbium doped Si Schottky diodes prepared by molecular beam epitaxy. Applied Physics Letters, 71(8), 1023–1025.

Authors 4
  1. Chun-Xia Du (first)
  2. Wei-Xin Ni (additional)
  3. Kenneth B. Joelsson (additional)
  4. Göran V. Hansson (additional)
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Dates
Type When
Created 23 years, 1 month ago (July 26, 2002, 9:31 a.m.)
Deposited 1 year, 6 months ago (Feb. 3, 2024, 8:07 a.m.)
Indexed 5 months ago (March 30, 2025, 5:29 a.m.)
Issued 28 years ago (Aug. 25, 1997)
Published 28 years ago (Aug. 25, 1997)
Published Print 28 years ago (Aug. 25, 1997)
Funders 0

None

@article{Du_1997, title={Room temperature 1.54 μm light emission of erbium doped Si Schottky diodes prepared by molecular beam epitaxy}, volume={71}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.119715}, DOI={10.1063/1.119715}, number={8}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Du, Chun-Xia and Ni, Wei-Xin and Joelsson, Kenneth B. and Hansson, Göran V.}, year={1997}, month=aug, pages={1023–1025} }