Abstract
Schottky-type light emitting devices have been fabricated on Er-oxide doped Si layers grown by molecular beam epitaxy, in order to study the light emission process of Er-doped Si structures. By applying a reverse bias on the Schottky junction, Er ions incorporated within the depletion layer can be electrically excited via a hot electron impact process. Rather intense electroluminescence (EL) at a wavelength of 1.54 μm has been observed at room temperature. The optoelectronic properties of the devices have been characterized by both input-power dependent and temperature dependent EL measurements. An activation energy value of ∼160 meV responsible for luminescence thermal quenching has been obtained.
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@article{Du_1997, title={Room temperature 1.54 μm light emission of erbium doped Si Schottky diodes prepared by molecular beam epitaxy}, volume={71}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.119715}, DOI={10.1063/1.119715}, number={8}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Du, Chun-Xia and Ni, Wei-Xin and Joelsson, Kenneth B. and Hansson, Göran V.}, year={1997}, month=aug, pages={1023–1025} }