Abstract
We report a very low dark current (∼57 pA at 10 V reverse bias) metal–semiconductor–metal photodetectors fabricated on GaN epitaxial layers grown by low-pressure metalorganic chemical vapor deposition. The photodetectors exhibit the typical sharp band-edge cutoff, with good responsivity. There is indication of a photoconductive gain mechanism. We also performed a Medici simulation to establish an effective area for current density calculations.
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Dates
Type | When |
---|---|
Created | 23 years ago (July 26, 2002, 8:40 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 3, 2024, 7:30 a.m.) |
Indexed | 2 months, 1 week ago (June 14, 2025, 11:28 a.m.) |
Issued | 28 years, 4 months ago (April 14, 1997) |
Published | 28 years, 4 months ago (April 14, 1997) |
Published Print | 28 years, 4 months ago (April 14, 1997) |
@article{Carrano_1997, title={Very low dark current metal–semiconductor–metal ultraviolet photodetectors fabricated on single-crystal GaN epitaxial layers}, volume={70}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.118777}, DOI={10.1063/1.118777}, number={15}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Carrano, J. C. and Grudowski, P. A. and Eiting, C. J. and Dupuis, R. D. and Campbell, J. C.}, year={1997}, month=apr, pages={1992–1994} }