Abstract
We present a study of electrical characteristics of ferroelectric field-effect transistors made of PbZr0.2Ti0.8O3 and SnO2:Sb thin films. Due to properly chosen semiconductor parameters, the transistor channel can be totally depleted by the ferroelectric charge displacement. The observed remnant on/off ratio of the channel current amounts to 7×103. Pulse response measurements give information on data retention, device speed, and the occurrence of charge injection. The results lead to important design considerations for ferroelectric transistors.
References
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 9:36 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 3, 2024, 7:09 a.m.) |
Indexed | 1 year, 6 months ago (Feb. 7, 2024, 7:59 p.m.) |
Issued | 28 years, 7 months ago (Jan. 27, 1997) |
Published | 28 years, 7 months ago (Jan. 27, 1997) |
Published Print | 28 years, 7 months ago (Jan. 27, 1997) |
@article{Prins_1997, title={Depletion-type thin-film transistors with a ferroelectric insulator}, volume={70}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.118180}, DOI={10.1063/1.118180}, number={4}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Prins, M. W. J. and Zinnemers, S. E. and Cillessen, J. F. M. and Giesbers, J. B.}, year={1997}, month=jan, pages={458–460} }