Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

The x-ray line profiles of an ultrafine grained copper crystal, produced by equal-channel angular pressing, were measured by a special high resolution diffractometer with negligible instrumental line broadening. The analysis of the line breadths and the Fourier coefficients have shown that taking into account the contrast caused by dislocations on line profiles gives new scaling factors in the Williamson–Hall plot and in the Warren–Averbach analysis, respectively. When strain is caused by dislocations the new procedure proposed here enables a straightforward determination of particle size and strain, the latter in terms of the dislocation density.

Bibliography

Ungár, T., & Borbély, A. (1996). The effect of dislocation contrast on x-ray line broadening: A new approach to line profile analysis. Applied Physics Letters, 69(21), 3173–3175.

Authors 2
  1. T. Ungár (first)
  2. A. Borbély (additional)
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Dates
Type When
Created 23 years, 1 month ago (July 26, 2002, 8:27 a.m.)
Deposited 1 year, 7 months ago (Feb. 3, 2024, 6:48 a.m.)
Indexed 1 day, 21 hours ago (Sept. 2, 2025, 6:35 a.m.)
Issued 28 years, 9 months ago (Nov. 18, 1996)
Published 28 years, 9 months ago (Nov. 18, 1996)
Published Print 28 years, 9 months ago (Nov. 18, 1996)
Funders 0

None

@article{Ung_r_1996, title={The effect of dislocation contrast on x-ray line broadening: A new approach to line profile analysis}, volume={69}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.117951}, DOI={10.1063/1.117951}, number={21}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Ungár, T. and Borbély, A.}, year={1996}, month=nov, pages={3173–3175} }