Abstract
In0.09Ga0.91N/GaN and In0.35Ga0.65N/Al0.1Ga0.9N multiquantum well structures (MQW) were grown by molecular beam epitaxy on (0001) sapphire substrates. The thickness of the wells and the barriers were in the range of 80–120 Å. The microstructure of these MQW structures was investigated by transmission electron microscopy. The room temperature photoluminescence spectra in these MQW structures peak at 387 and 463 nm with full width at half maximum of 16 and 28 nm, respectively.
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 9:07 a.m.) |
Deposited | 1 year, 7 months ago (Feb. 3, 2024, 6:36 a.m.) |
Indexed | 2 months, 1 week ago (June 24, 2025, 7:28 a.m.) |
Issued | 28 years, 10 months ago (Oct. 14, 1996) |
Published | 28 years, 10 months ago (Oct. 14, 1996) |
Published Print | 28 years, 10 months ago (Oct. 14, 1996) |
@article{Singh_1996, title={Growth and properties of InxGa1‚ąíxN/AlyGa1‚ąíyN multiquantum wells developed by molecular beam epitaxy}, volume={69}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.117646}, DOI={10.1063/1.117646}, number={16}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Singh, R. and Doppalapudi, D. and Moustakas, T. D.}, year={1996}, month=oct, pages={2388‚Äď2390} }