Abstract
We report record high breakdown voltages up to 340 and 230 V realized on unintentionally doped (1.5 μm gate length) and Si doped (1 μm gate length) AlGaN/GaN modulation doped field effect transistors (MODFETs), respectively. The devices also have large transconductances up to 140 mS/mm and a full channel current of 150–400 mA/mm. The Si doped MODFET sample demonstrated a very high room temperature mobility of 1500 cm2/Vs. With these specifications, GaN field effect transistors as microwave power devices are practical.
References
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Dates
Type | When |
---|---|
Created | 23 years ago (July 26, 2002, 9:40 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 3, 2024, 6:21 a.m.) |
Indexed | 2 months, 2 weeks ago (June 6, 2025, 4:47 a.m.) |
Issued | 28 years, 11 months ago (Sept. 2, 1996) |
Published | 28 years, 11 months ago (Sept. 2, 1996) |
Published Print | 28 years, 11 months ago (Sept. 2, 1996) |
@article{Wu_1996, title={Very high breakdown voltage and large transconductance realized on GaN heterojunction field effect transistors}, volume={69}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.117607}, DOI={10.1063/1.117607}, number={10}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Wu, Y.-F. and Keller, B. P. and Keller, S. and Kapolnek, D. and Kozodoy, P. and Denbaars, S. P. and Mishra, U. K.}, year={1996}, month=sep, pages={1438–1440} }