DOI: 10.1063/1.117519. Highly tetrahedral amorphous carbon films with low stress

Highly tetrahedral amorphous carbon films with low stress

10.1063/1.117519

Crossref journal-article

AIP Publishing

Applied Physics Letters (317)

Abstract

We have deposited boronated highly tetrahedral amorphous carbon (ta-C:B) films with low stress using a filtered cathodic vacuum arc. The sp3 fraction, hardness, and resistivity were measured as a function of the ion energy and were found to reach a maximum above 50 eV for B concentrations of 2% and 4%. The most significant result we found was that highly tetrahedral a-C:B film (sp3≊80%) with low stress (1–3 GPa) with B concentrations up to 4% could be obtained. The B in the films was found to be predominantly (≊75%) sp2 bonded. Additionally, the stress in the films did not vary with the ion energy or sp3 fraction unlike in regular ta-C films.

Bibliography

Chhowalla, M., Yin, Y., Amaratunga, G. A. J., McKenzie, D. R., & Frauenheim, Th. (1996). Highly tetrahedral amorphous carbon films with low stress. Applied Physics Letters, 69(16), 2344â2346.

Authors 5

M. Chhowalla (first)
Y. Yin (additional)
G. A. J. Amaratunga (additional)
D. R. McKenzie (additional)
Th. Frauenheim (additional)

References 20 Referenced 106

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{'key': '2024020311343842300_r2', 'first-page': '12', 'article-title': 'Phys. Rev. B', 'volume': '48', 'year': '1993'} / Phys. Rev. B (1993)
{'key': '2024020311343842300_r3', 'first-page': '2753', 'article-title': 'Phys. Rev. Lett.', 'volume': '72', 'year': '1994'} / Phys. Rev. Lett. (1994)
{'key': '2024020311343842300_r4'}
{'key': '2024020311343842300_r5', 'first-page': '899', 'article-title': 'Diam. Relat. Mater.', 'volume': '3', 'year': '1944'} / Diam. Relat. Mater. (1944)
{'key': '2024020311343842300_r6', 'first-page': '2529', 'article-title': 'Appl. Phys. Lett.', 'volume': '68', 'year': '1996'} / Appl. Phys. Lett. (1996)
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{'key': '2024020311343842300_r13', 'first-page': '41', 'article-title': 'Mater. Sci. Eng. A', 'volume': '107', 'year': '1989'} / Mater. Sci. Eng. A (1989)
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{'key': '2024020311343842300_r17'}
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{'key': '2024020311343842300_r20'}

Dates

Type	When
Created	23 years, 1 month ago (July 26, 2002, 9:40 a.m.)
Deposited	1 year, 6 months ago (Feb. 3, 2024, 6:34 a.m.)
Indexed	1 year, 1 month ago (July 25, 2024, 10:37 a.m.)
Issued	28 years, 10 months ago (Oct. 14, 1996)
Published	28 years, 10 months ago (Oct. 14, 1996)
Published Print	28 years, 10 months ago (Oct. 14, 1996)

Funders 0

None

BibTeX

@article{Chhowalla_1996, title={Highly tetrahedral amorphous carbon films with low stress}, volume={69}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.117519}, DOI={10.1063/1.117519}, number={16}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Chhowalla, M. and Yin, Y. and Amaratunga, G. A. J. and McKenzie, D. R. and Frauenheim, Th.}, year={1996}, month=oct, pages={2344–2346} }

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