Abstract
The doping of AlN during growth by metalorganic molecular beam epitaxy with an Er effusion source has resulted in AlN:Er films exhibiting strong room-temperature 1.54 μm photoluminescence (PL). The luminescence detected in the AlN:Er grown during this study was orders of magnitude greater in intensity than that from ion-implanted samples and represents the first demonstration of strong emission from rare-earth doped, epitaxial group III nitrides. Secondary ion mass spectroscopy was used to verify a dynamic range for this doping technique of 3×1017–2×1021 Er cm−3 with varying effusion cell temperature. The effects of growth temperature on Er incorporation and segregation behavior were also determined. PL studies, including room-temperature and thermal quenching experiments, were conducted.
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 9:40 a.m.) |
Deposited | 1 year, 7 months ago (Feb. 3, 2024, 6:30 a.m.) |
Indexed | 4 months, 1 week ago (April 28, 2025, 2:22 p.m.) |
Issued | 28 years, 11 months ago (Sept. 30, 1996) |
Published | 28 years, 11 months ago (Sept. 30, 1996) |
Published Print | 28 years, 11 months ago (Sept. 30, 1996) |
@article{MacKenzie_1996, title={Er doping of AlN during growth by metalorganic molecular beam epitaxy}, volume={69}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.116887}, DOI={10.1063/1.116887}, number={14}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={MacKenzie, J. D. and Abernathy, C. R. and Pearton, S. J. and Hömmerich, U. and Wu, X. and Schwartz, R. N. and Wilson, R. G. and Zavada, J. M.}, year={1996}, month=sep, pages={2083–2085} }