Abstract
The size evolution of molecular beam epitaxy-grown strained InAs three-dimensional (3D) islands on GaAs(001) is examined using in situ ultrahigh vacuum atomic force microscopy. Remarkably, just after the initiation of well-formed 3D islands at ∼1.57 ML InAs deposition, the lateral size dispersion and average value are found to first increase drastically with the smallest amount (∼0.05 ML) of additional InAs deposition and then decrease and saturate, indicating the onset of a natural tendency for size equalization, including through loss of material from the initially formed largest islands. These observations are found to be consistent with the previously suggested island-separation dependent influence of the evolving island-induced substrate strain fields on the adatom migration and incorporation/detachment kinetics that control the evolution of the islands.
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Dates
Type | When |
---|---|
Created | 23 years ago (July 26, 2002, 9:40 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 3, 2024, 5:52 a.m.) |
Indexed | 1 month, 2 weeks ago (July 7, 2025, 4:44 a.m.) |
Issued | 29 years, 2 months ago (June 3, 1996) |
Published | 29 years, 2 months ago (June 3, 1996) |
Published Print | 29 years, 2 months ago (June 3, 1996) |
@article{Kobayashi_1996, title={In situ, atomic force microscope studies of the evolution of InAs three-dimensional islands on GaAs(001)}, volume={68}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.116580}, DOI={10.1063/1.116580}, number={23}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Kobayashi, N. P. and Ramachandran, T. R. and Chen, P. and Madhukar, A.}, year={1996}, month=jun, pages={3299–3301} }