Abstract
We have fabricated erbium–oxygen-doped silicon light emitting diodes with molecular beam epitaxy by simultaneously evaporating erbium and silicon and providing a suitable background pressure of oxygen. In reverse bias, the diodes show intense room-temperature electroluminescence at λ=1.54 μm, originating from the intra-4f transition of erbium. This luminescence does not show temperature quenching between 4 and 300 K. In forward bias the erbium peak intensity is reduced by a factor of 30 at low temperatures and shows temperature quenching.
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 9:40 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 3, 2024, 5:53 a.m.) |
Indexed | 5 months ago (March 30, 2025, 5:29 a.m.) |
Issued | 29 years, 2 months ago (June 3, 1996) |
Published | 29 years, 2 months ago (June 3, 1996) |
Published Print | 29 years, 2 months ago (June 3, 1996) |
@article{Stimmer_1996, title={Electroluminescence of erbium–oxygen-doped silicon diodes grown by molecular beam epitaxy}, volume={68}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.116577}, DOI={10.1063/1.116577}, number={23}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Stimmer, J. and Reittinger, A. and Nützel, J. F. and Abstreiter, G. and Holzbrecher, H. and Buchal, Ch.}, year={1996}, month=jun, pages={3290–3292} }