Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

We have fabricated erbium–oxygen-doped silicon light emitting diodes with molecular beam epitaxy by simultaneously evaporating erbium and silicon and providing a suitable background pressure of oxygen. In reverse bias, the diodes show intense room-temperature electroluminescence at λ=1.54 μm, originating from the intra-4f transition of erbium. This luminescence does not show temperature quenching between 4 and 300 K. In forward bias the erbium peak intensity is reduced by a factor of 30 at low temperatures and shows temperature quenching.

Bibliography

Stimmer, J., Reittinger, A., Nützel, J. F., Abstreiter, G., Holzbrecher, H., & Buchal, Ch. (1996). Electroluminescence of erbium–oxygen-doped silicon diodes grown by molecular beam epitaxy. Applied Physics Letters, 68(23), 3290–3292.

Authors 6
  1. J. Stimmer (first)
  2. A. Reittinger (additional)
  3. J. F. Nützel (additional)
  4. G. Abstreiter (additional)
  5. H. Holzbrecher (additional)
  6. Ch. Buchal (additional)
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Dates
Type When
Created 23 years, 1 month ago (July 26, 2002, 9:40 a.m.)
Deposited 1 year, 6 months ago (Feb. 3, 2024, 5:53 a.m.)
Indexed 5 months ago (March 30, 2025, 5:29 a.m.)
Issued 29 years, 2 months ago (June 3, 1996)
Published 29 years, 2 months ago (June 3, 1996)
Published Print 29 years, 2 months ago (June 3, 1996)
Funders 0

None

@article{Stimmer_1996, title={Electroluminescence of erbium–oxygen-doped silicon diodes grown by molecular beam epitaxy}, volume={68}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.116577}, DOI={10.1063/1.116577}, number={23}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Stimmer, J. and Reittinger, A. and Nützel, J. F. and Abstreiter, G. and Holzbrecher, H. and Buchal, Ch.}, year={1996}, month=jun, pages={3290–3292} }