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journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract
X-ray photoemission spectroscopy has been used to measure the valence band offset ΔEv for the AlN/GaN (0001) heterojunction interface. The heterojunction samples were grown by reactive molecular beam epitaxy on 6H–SiC (0001) substrates. A nested interface band alignment with ΔEv=1.36±0.07 eV is obtained (ΔEc/ΔEv=52/48).
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 9:40 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 3, 2024, 5:48 a.m.) |
Indexed | 2 weeks, 5 days ago (Aug. 7, 2025, 4:34 p.m.) |
Issued | 29 years, 3 months ago (May 13, 1996) |
Published | 29 years, 3 months ago (May 13, 1996) |
Published Print | 29 years, 3 months ago (May 13, 1996) |
@article{Waldrop_1996, title={Measurement of AlN/GaN (0001) heterojunction band offsets by x-ray photoemission spectroscopy}, volume={68}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.116355}, DOI={10.1063/1.116355}, number={20}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Waldrop, J. R. and Grant, R. W.}, year={1996}, month=may, pages={2879–2881} }