Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

Hydrogenated amorphous silicon thin films are doped with erbium by ion implantation. Room-temperature photoluminescence at 1.54 μm, due to an intra-4f transition in Er4+, is observed after thermal annealing at 300–400 °C. Excitation of Er3+ is shown to be mediated by photocarriers. The Er3+ luminescence intensity is quenched by a factor of 15 as the temperature is raised from 10 K to room temperature. Codoping with oxygen (1 at. %) reduces the luminescence quenching to a factor of 7. The quenching is well correlated with a decrease in luminescence lifetime, indicating that nonradiative decay of excited Er3+ is the dominant quenching mechanism as the temperature is increased.

Bibliography

Shin, J. H., Serna, R., van den Hoven, G. N., Polman, A., van Sark, W. G. J. H. M., & Vredenberg, A. M. (1996). Luminescence quenching in erbium-doped hydrogenated amorphous silicon. Applied Physics Letters, 68(7), 997–999.

Authors 6
  1. Jung H. Shin (first)
  2. R. Serna (additional)
  3. G. N. van den Hoven (additional)
  4. A. Polman (additional)
  5. W. G. J. H. M. van Sark (additional)
  6. A. M. Vredenberg (additional)
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Dates
Type When
Created 23 years, 1 month ago (July 26, 2002, 8:46 a.m.)
Deposited 1 year, 7 months ago (Feb. 3, 2024, 5:24 a.m.)
Indexed 1 month, 1 week ago (July 23, 2025, 9 a.m.)
Issued 29 years, 6 months ago (Feb. 12, 1996)
Published 29 years, 6 months ago (Feb. 12, 1996)
Published Print 29 years, 6 months ago (Feb. 12, 1996)
Funders 0

None

@article{Shin_1996, title={Luminescence quenching in erbium-doped hydrogenated amorphous silicon}, volume={68}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.116124}, DOI={10.1063/1.116124}, number={7}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Shin, Jung H. and Serna, R. and van den Hoven, G. N. and Polman, A. and van Sark, W. G. J. H. M. and Vredenberg, A. M.}, year={1996}, month=feb, pages={997–999} }