Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

We investigate the interactions between hydrogen and dopant impurities in GaN, using state-of-the-art first-principles calculations. Our results for energetics and migration reveal a fundamental difference in the behavior of hydrogen between p-type and n-type material; in particular, we explain why hydrogen concentrations in n-type GaN are low, and why hydrogen has a beneficial effect on acceptor incorporation in p-type GaN. Our results identify the conditions under which hydrogen can be used to control doping in semiconductors in general.

Bibliography

Neugebauer, J., & Van de Walle, C. G. (1996). Role of hydrogen in doping of GaN. Applied Physics Letters, 68(13), 1829–1831.

Authors 2
  1. Jörg Neugebauer (first)
  2. Chris G. Van de Walle (additional)
References 13 Referenced 309
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Dates
Type When
Created 23 years, 1 month ago (July 26, 2002, 9:40 a.m.)
Deposited 1 year, 6 months ago (Feb. 3, 2024, 5:34 a.m.)
Indexed 3 days, 7 hours ago (Aug. 23, 2025, 9:21 p.m.)
Issued 29 years, 5 months ago (March 25, 1996)
Published 29 years, 5 months ago (March 25, 1996)
Published Print 29 years, 5 months ago (March 25, 1996)
Funders 0

None

@article{Neugebauer_1996, title={Role of hydrogen in doping of GaN}, volume={68}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.116027}, DOI={10.1063/1.116027}, number={13}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Neugebauer, Jörg and Van de Walle, Chris G.}, year={1996}, month=mar, pages={1829–1831} }