DOI: 10.1063/1.115958. Ultrahigh resolution of calixarene negative resist in electron beam lithography

Ultrahigh resolution of calixarene negative resist in electron beam lithography

10.1063/1.115958

Crossref journal-article

AIP Publishing

Applied Physics Letters (317)

Abstract

A nonpolymer material, calixarene derivative (hexaacetate p-methnylcalix[6]arene) was tested as a high-resolution negative resist under an electron beam lithography process. It showed under 10-mm resolution with little side roughness and high durability to halide plasma etching. A sub-10-nm Ge quantum wire was perfectly etched off without defects. Such a performance is suitable for nanoscale device processes.

Bibliography

Fujita, J., Ohnishi, Y., Ochiai, Y., & Matsui, S. (1996). Ultrahigh resolution of calixarene negative resist in electron beam lithography. Applied Physics Letters, 68(9), 1297â1299.

Authors 4

J. Fujita (first)
Y. Ohnishi (additional)
Y. Ochiai (additional)
S. Matsui (additional)

References 7 Referenced 208

{'key': '2024020310271749900_r1', 'first-page': '114', 'article-title': 'IBM J. Res. Dev.', 'volume': '21', 'year': '1988'} / IBM J. Res. Dev. (1988)
{'key': '2024020310271749900_r2', 'first-page': '4562', 'article-title': 'Jpn. J. Appl. Phys.', 'volume': '34', 'year': '1995'} / Jpn. J. Appl. Phys. (1995)
{'key': '2024020310271749900_r3', 'first-page': '524', 'article-title': 'Nature', 'volume': '344', 'year': '1991'} / Nature (1991)
{'key': '2024020310271749900_r4', 'first-page': '344', 'article-title': 'Nature', 'volume': '344', 'year': '1991'} / Nature (1991)
{'key': '2024020310271749900_r5'}
{'key': '2024020310271749900_r6'}
{'key': '2024020310271749900_r7', 'first-page': '764', 'article-title': 'Appl. Phys. Lett.', 'volume': '63', 'year': '1993'} / Appl. Phys. Lett. (1993)

Dates

Type	When
Created	23 years, 1 month ago (July 26, 2002, 9:40 a.m.)
Deposited	1 year, 6 months ago (Feb. 3, 2024, 5:27 a.m.)
Indexed	3 months ago (June 2, 2025, 12:22 a.m.)
Issued	29 years, 6 months ago (Feb. 26, 1996)
Published	29 years, 6 months ago (Feb. 26, 1996)
Published Print	29 years, 6 months ago (Feb. 26, 1996)

Funders 0

None

BibTeX

@article{Fujita_1996, title={Ultrahigh resolution of calixarene negative resist in electron beam lithography}, volume={68}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.115958}, DOI={10.1063/1.115958}, number={9}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Fujita, J. and Ohnishi, Y. and Ochiai, Y. and Matsui, S.}, year={1996}, month=feb, pages={1297–1299} }

JSON

{
  "indexed": {
    "date-parts": [
      [
        2025,
        6,
        2
      ]
    ],
    "date-time": "2025-06-02T04:22:49Z",
    "timestamp": 1748838169113
  },
  "reference-count": 7,
  "publisher": "AIP Publishing",
  "issue": "9",
  "content-domain": {
    "domain": [
      "pubs.aip.org"
    ],
    "crossmark-restriction": true
  },
  "published-print": {
    "date-parts": [
      [
        1996,
        2,
        26
      ]
    ]
  },
  "abstract": "<jats:p>A nonpolymer material, calixarene derivative (hexaacetate p-methnylcalix[6]arene) was tested as a high-resolution negative resist under an electron beam lithography process. It showed under 10-mm resolution with little side roughness and high durability to halide plasma etching. A sub-10-nm Ge quantum wire was perfectly etched off without defects. Such a performance is suitable for nanoscale device processes.</jats:p>",
  "DOI": "10.1063/1.115958",
  "type": "journal-article",
  "created": {
    "date-parts": [
      [
        2002,
        7,
        26
      ]
    ],
    "date-time": "2002-07-26T13:40:49Z",
    "timestamp": 1027690849000
  },
  "page": "1297-1299",
  "update-policy": "http://dx.doi.org/10.1063/aip-crossmark-policy-page",
  "source": "Crossref",
  "is-referenced-by-count": 208,
  "title": "Ultrahigh resolution of calixarene negative resist in electron beam lithography",
  "prefix": "10.1063",
  "volume": "68",
  "author": [
    {
      "given": "J.",
      "family": "Fujita",
      "sequence": "first",
      "affiliation": [
        {
          "name": "Fundamental Research Laboratories, NEC Corporation, 34 Miyukigaoka, Tsukuba 305, Japan"
        }
      ]
    },
    {
      "given": "Y.",
      "family": "Ohnishi",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "Fundamental Research Laboratories, NEC Corporation, 34 Miyukigaoka, Tsukuba 305, Japan"
        }
      ]
    },
    {
      "given": "Y.",
      "family": "Ochiai",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "Fundamental Research Laboratories, NEC Corporation, 34 Miyukigaoka, Tsukuba 305, Japan"
        }
      ]
    },
    {
      "given": "S.",
      "family": "Matsui",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "Fundamental Research Laboratories, NEC Corporation, 34 Miyukigaoka, Tsukuba 305, Japan"
        }
      ]
    }
  ],
  "member": "317",
  "reference": [
    {
      "key": "2024020310271749900_r1",
      "first-page": "114",
      "article-title": "IBM J. Res. Dev.",
      "volume": "21",
      "year": "1988"
    },
    {
      "key": "2024020310271749900_r2",
      "first-page": "4562",
      "article-title": "Jpn. J. Appl. Phys.",
      "volume": "34",
      "year": "1995"
    },
    {
      "key": "2024020310271749900_r3",
      "first-page": "524",
      "article-title": "Nature",
      "volume": "344",
      "year": "1991"
    },
    {
      "key": "2024020310271749900_r4",
      "first-page": "344",
      "article-title": "Nature",
      "volume": "344",
      "year": "1991"
    },
    {
      "key": "2024020310271749900_r5"
    },
    {
      "key": "2024020310271749900_r6"
    },
    {
      "key": "2024020310271749900_r7",
      "first-page": "764",
      "article-title": "Appl. Phys. Lett.",
      "volume": "63",
      "year": "1993"
    }
  ],
  "container-title": "Applied Physics Letters",
  "original-title": [],
  "language": "en",
  "link": [
    {
      "URL": "https://pubs.aip.org/aip/apl/article-pdf/68/9/1297/18517499/1297_1_online.pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "syndication"
    },
    {
      "URL": "https://pubs.aip.org/aip/apl/article-pdf/68/9/1297/18517499/1297_1_online.pdf",
      "content-type": "unspecified",
      "content-version": "vor",
      "intended-application": "similarity-checking"
    }
  ],
  "deposited": {
    "date-parts": [
      [
        2024,
        2,
        3
      ]
    ],
    "date-time": "2024-02-03T10:27:24Z",
    "timestamp": 1706956044000
  },
  "score": 1,
  "resource": {
    "primary": {
      "URL": "https://pubs.aip.org/apl/article/68/9/1297/308800/Ultrahigh-resolution-of-calixarene-negative-resist"
    }
  },
  "subtitle": [],
  "short-title": [],
  "issued": {
    "date-parts": [
      [
        1996,
        2,
        26
      ]
    ]
  },
  "references-count": 7,
  "journal-issue": {
    "issue": "9",
    "published-print": {
      "date-parts": [
        [
          1996,
          2,
          26
        ]
      ]
    }
  },
  "URL": "http://dx.doi.org/10.1063/1.115958",
  "relation": {},
  "ISSN": [
    "0003-6951",
    "1077-3118"
  ],
  "subject": [],
  "published-other": {
    "date-parts": [
      [
        1996,
        2,
        26
      ]
    ]
  },
  "published": {
    "date-parts": [
      [
        1996,
        2,
        26
      ]
    ]
  }
}