Abstract
Pseudomorphic Si1−x−yGexCy alloy layers on Si (100) with band-edge photoluminescence and without defect-related luminescence have been achieved. The photoluminescence was measured from 2 to 77 K and was used to make a direct measurement of the band gap shift as a function of strain reduction as C was added. Compared to the effect of just reducing Ge content, results show that as C is added, strain is reduced more efficiently than the band gap is increased. Furthermore, results imply that a fully strain-compensated Si1−x−yGexCy layer on Si (100) would have a band gap much less than that of Si, and suggest that initial C incorporation reduces the band gap of relaxed, unstrained Si1−x−yGexCy alloys.
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 9:07 a.m.) |
Deposited | 1 year, 7 months ago (Feb. 3, 2024, 5:06 a.m.) |
Indexed | 1 year, 6 months ago (Feb. 10, 2024, 10:38 p.m.) |
Issued | 29 years, 8 months ago (Dec. 25, 1995) |
Published | 29 years, 8 months ago (Dec. 25, 1995) |
Published Print | 29 years, 8 months ago (Dec. 25, 1995) |
@article{St_Amour_1995, title={Defect-free band-edge photoluminescence and band gap measurement of pseudomorphic Si1−x−yGexCy alloy layers on Si (100)}, volume={67}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.115316}, DOI={10.1063/1.115316}, number={26}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={St. Amour, A. and Liu, C. W. and Sturm, J. C. and Lacroix, Y. and Thewalt, M. L. W.}, year={1995}, month=dec, pages={3915–3917} }