Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

Direct-write lithography on a 100 nm scale has been carried out using the near-field optical interaction between an uncoated tapered fiber tip and a layer of photoresist. This allows both lithography and shear force microscopic examination of the surface, which reveals morphological changes in the photoresist before development.

Bibliography

Smolyaninov, I. I., Mazzoni, D. L., & Davis, C. C. (1995). Near-field direct-write ultraviolet lithography and shear force microscopic studies of the lithographic process. Applied Physics Letters, 67(26), 3859–3861.

Authors 3
  1. Igor I. Smolyaninov (first)
  2. David L. Mazzoni (additional)
  3. Christopher C. Davis (additional)
References 7 Referenced 87
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Dates
Type When
Created 23 years, 1 month ago (July 26, 2002, 9:40 a.m.)
Deposited 1 year, 7 months ago (Feb. 3, 2024, 5:06 a.m.)
Indexed 1 year, 3 months ago (June 7, 2024, 3:18 a.m.)
Issued 29 years, 8 months ago (Dec. 25, 1995)
Published 29 years, 8 months ago (Dec. 25, 1995)
Published Print 29 years, 8 months ago (Dec. 25, 1995)
Funders 0

None

@article{Smolyaninov_1995, title={Near-field direct-write ultraviolet lithography and shear force microscopic studies of the lithographic process}, volume={67}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.115297}, DOI={10.1063/1.115297}, number={26}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Smolyaninov, Igor I. and Mazzoni, David L. and Davis, Christopher C.}, year={1995}, month=dec, pages={3859–3861} }