Abstract
We report the direct observation of transferred-electron effect in unintentionally doped GaN epilayers grown by metalorganic chemical vapor deposition. The negative differential resistivity (NDR) was observed from the current-electric field characteristics in GaN using a metal-semiconductor-metal (M-S-M) system. The threshold field for the onset of NDR was independent of the spacing of M-S-M fingers, and was measured to be 1.91×105 V/cm for GaN with an n-type carrier concentration of 1014 cm−3. This value is very close to the value obtained from theoretical simulation. This observation is an experimental evidence of transferred-electron effects in GaN, which is important in understanding GaN energy band structure and in the application of Gunn-effect devices using GaN materials.
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 9:40 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 3, 2024, 4:51 a.m.) |
Indexed | 1 year, 6 months ago (Feb. 7, 2024, 8:21 p.m.) |
Issued | 29 years, 9 months ago (Nov. 6, 1995) |
Published | 29 years, 9 months ago (Nov. 6, 1995) |
Published Print | 29 years, 9 months ago (Nov. 6, 1995) |
@article{Huang_1995, title={Direct observation of transferred-electron effect in GaN}, volume={67}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.114797}, DOI={10.1063/1.114797}, number={19}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Huang, Z. C. and Goldberg, R. and Chen, J. C. and Zheng, Youdou and Mott, D. Brent and Shu, P.}, year={1995}, month=nov, pages={2825–2826} }