Abstract
Schottky barriers on n-type GaN films grown by low-pressure metalorganic chemical vapor deposition are characterized and derived. A thin Pt or a Pd layer is deposited by electron-gun evaporation to form Schottky contacts in a vacuum below 1×10−6 Torr. The Schottky barrier heights of Pt on the n-GaN film are determined to be 1.04 and 1.03 eV by current–voltage (C–V) and current density–temperature (J–T) measurements, respectively. Also based on C–V and J–T measurements, the measured barrier height of Pd on n-GaN is 0.94 and 0.91 eV, respectively. Schottky characteristics of Pt and Pd observed in the experiment are compared with those of Au and Ti in previous reports.
References
12
Referenced
131
{'key': '2024020309494521300_r1', 'first-page': '28', 'article-title': 'Appl. Phys. Lett.', 'volume': '64', 'year': '1994'}
/ Appl. Phys. Lett. (1994){'key': '2024020309494521300_r2', 'first-page': '1786', 'article-title': 'Appl. Phys. Lett.', 'volume': '62', 'year': '1993'}
/ Appl. Phys. Lett. (1993){'key': '2024020309494521300_r3', 'first-page': '1214', 'article-title': 'Appl. Phys. Lett.', 'volume': '63', 'year': '1993'}
/ Appl. Phys. Lett. (1993){'key': '2024020309494521300_r4', 'first-page': '2917', 'article-title': 'Appl. Phys. Lett.', 'volume': '60', 'year': '1992'}
/ Appl. Phys. Lett. (1992){'key': '2024020309494521300_r5', 'first-page': '1', 'article-title': 'Appl. Phys. Lett.', 'volume': '63', 'year': '1993'}
/ Appl. Phys. Lett. (1993){'key': '2024020309494521300_r6', 'first-page': '1003', 'article-title': 'Appl. Phys. Lett.', 'volume': '64', 'year': '1994'}
/ Appl. Phys. Lett. (1994){'key': '2024020309494521300_r7', 'first-page': '2859', 'article-title': 'Appl. Phys. Lett.', 'volume': '62', 'year': '1993'}
/ Appl. Phys. Lett. (1993){'key': '2024020309494521300_r8', 'first-page': '2676', 'article-title': 'Appl. Phys. Lett.', 'volume': '63', 'year': '1993'}
/ Appl. Phys. Lett. (1993){'key': '2024020309494521300_r9', 'first-page': '909', 'article-title': 'Electron. Lett.', 'volume': '30', 'year': '1994'}
/ Electron. Lett. (1994){'key': '2024020309494521300_r10', 'first-page': '320', 'article-title': 'IEEE Electron Device Lett.', 'volume': '4', 'year': '1983'}
/ IEEE Electron Device Lett. (1983){'key': '2024020309494521300_r11'}
{'key': '2024020309494521300_r12', 'first-page': 'L735', 'article-title': 'J. Phys. C', 'volume': '11', 'year': '1978'}
/ J. Phys. C (1978)
Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 9:40 a.m.) |
Deposited | 1 year, 7 months ago (Feb. 3, 2024, 4:49 a.m.) |
Indexed | 2 months ago (July 3, 2025, 12:03 p.m.) |
Issued | 29 years, 10 months ago (Oct. 30, 1995) |
Published | 29 years, 10 months ago (Oct. 30, 1995) |
Published Print | 29 years, 10 months ago (Oct. 30, 1995) |
@article{Guo_1995, title={Study of Schottky barriers on n-type GaN grown by low-pressure metalorganic chemical vapor deposition}, volume={67}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.114327}, DOI={10.1063/1.114327}, number={18}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Guo, J. D. and Feng, M. S. and Guo, R. J. and Pan, F. M. and Chang, C. Y.}, year={1995}, month=oct, pages={2657–2659} }