Abstract
ZnO thin film has been epitaxially grown on the (111) plane of the diamond substrate by rf magnetron sputtering at substrate temperature as low as 260 °C. The crystallinity was examined by x-ray diffraction and reflection high-energy electron diffraction. It was found that the smallest standard deviation angle estimated from the x-ray rocking curve of the ZnO(0002) peak was 0.27° whereas the mismatch of the lattice parameter between film and substrate is 28.8%. The epitaxial relationship between ZnO film and the diamond is determined as [112̄0] ZnO//[1̄01] diamond.
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 8:58 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 3, 2024, 3:07 a.m.) |
Indexed | 11 months, 3 weeks ago (Aug. 30, 2024, 9:54 a.m.) |
Issued | 30 years, 9 months ago (Nov. 14, 1994) |
Published | 30 years, 9 months ago (Nov. 14, 1994) |
Published Print | 30 years, 9 months ago (Nov. 14, 1994) |
@article{Hachigo_1994, title={Heteroepitaxial growth of ZnO films on diamond (111) plane by magnetron sputtering}, volume={65}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.112634}, DOI={10.1063/1.112634}, number={20}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Hachigo, Akihiro and Nakahata, Hideaki and Higaki, Kenjiro and Fujii, Satoshi and Shikata, Shin-ichi}, year={1994}, month=nov, pages={2556–2558} }