Abstract
La-modified PbTiO3(PLT: Pb0.9La0.1Ti0.975O3) thin films by rf magnetron sputtering were prepared on the preferred (100)-oriented oxide buffer layers with NaCl-type structure, which were prepared by plasma-enhanced metalorganic chemical vapor deposition. Fused silica, (111)Si, soda-lime glass, and stainless steel were used as the substrates to prepare the oxide buffer layers. The c-axis and a-axis preferred oriented PLT thin films were obtained on the buffer layer, independent of the kind of substrate. Further, highly c-axis oriented PLT thin films were obtained when the substrate had a large thermal expansion coefficient. Significant pyroelectric currents were detected without a poling treatment. The NiCr/PLT/(100)Pt/(100)MgO/stainless steel structure had a dielectric constant of 250, a dielectric loss factor tan δ of 0.8%, and a pyroelectric coefficient of 3.8×10−4 C/m2 K.
References
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 9:38 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 3, 2024, 2:53 a.m.) |
Indexed | 1 year, 6 months ago (Feb. 3, 2024, 4:28 p.m.) |
Issued | 30 years, 11 months ago (Sept. 12, 1994) |
Published | 30 years, 11 months ago (Sept. 12, 1994) |
Published Print | 30 years, 11 months ago (Sept. 12, 1994) |
@article{Fujii_1994, title={Preparation of La-modified PbTiO3 thin films on the oxide buffer layers with NaCl-type structure}, volume={65}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.112016}, DOI={10.1063/1.112016}, number={11}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Fujii, Satoru and Tomozawa, Atsushi and Fujii, Eiji and Torii, Hideo and Takayama, Ryoichi and Hirao, Takashi}, year={1994}, month=sep, pages={1463–1465} }