Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

This study demonstrates the presence of a negative electron affinity (NEA) surface on AlN was grown on α(6H)-SiC. Heteroepitaxial AlN was grown on α(6H)-SiC(0001) substrates by molecular beam epitaxy techniques. The surface electronic states were characterized by ultraviolet photoemission obtained at surface normal. The observation of a sharp spectral feature at the lowest energy of the emitted electrons is an indication of a surface with a negative electron affinity. In addition, the trend of the NEA feature was examined as a function of annealing. The surface Fermi level is found to be near the middle of the AlN gap, and a possible band alignment between the AlN and SiC is presented.

Bibliography

Benjamin, M. C., Wang, C., Davis, R. F., & Nemanich, R. J. (1994). Observation of a negative electron affinity for heteroepitaxial AlN on α(6H)-SiC(0001). Applied Physics Letters, 64(24), 3288–3290.

Authors 4
  1. M. C. Benjamin (first)
  2. Cheng Wang (additional)
  3. R. F. Davis (additional)
  4. R. J. Nemanich (additional)
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Dates
Type When
Created 23 years, 1 month ago (July 26, 2002, 9:38 a.m.)
Deposited 1 year, 6 months ago (Feb. 3, 2024, 2:26 a.m.)
Indexed 3 weeks, 5 days ago (Aug. 6, 2025, 8:03 a.m.)
Issued 31 years, 2 months ago (June 13, 1994)
Published 31 years, 2 months ago (June 13, 1994)
Published Print 31 years, 2 months ago (June 13, 1994)
Funders 0

None

@article{Benjamin_1994, title={Observation of a negative electron affinity for heteroepitaxial AlN on α(6H)-SiC(0001)}, volume={64}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.111312}, DOI={10.1063/1.111312}, number={24}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Benjamin, M. C. and Wang, Cheng and Davis, R. F. and Nemanich, R. J.}, year={1994}, month=jun, pages={3288–3290} }