Abstract
This study demonstrates the presence of a negative electron affinity (NEA) surface on AlN was grown on α(6H)-SiC. Heteroepitaxial AlN was grown on α(6H)-SiC(0001) substrates by molecular beam epitaxy techniques. The surface electronic states were characterized by ultraviolet photoemission obtained at surface normal. The observation of a sharp spectral feature at the lowest energy of the emitted electrons is an indication of a surface with a negative electron affinity. In addition, the trend of the NEA feature was examined as a function of annealing. The surface Fermi level is found to be near the middle of the AlN gap, and a possible band alignment between the AlN and SiC is presented.
References
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 9:38 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 3, 2024, 2:26 a.m.) |
Indexed | 3 weeks, 5 days ago (Aug. 6, 2025, 8:03 a.m.) |
Issued | 31 years, 2 months ago (June 13, 1994) |
Published | 31 years, 2 months ago (June 13, 1994) |
Published Print | 31 years, 2 months ago (June 13, 1994) |
@article{Benjamin_1994, title={Observation of a negative electron affinity for heteroepitaxial AlN on α(6H)-SiC(0001)}, volume={64}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.111312}, DOI={10.1063/1.111312}, number={24}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Benjamin, M. C. and Wang, Cheng and Davis, R. F. and Nemanich, R. J.}, year={1994}, month=jun, pages={3288–3290} }