Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

In this letter we report the fabrication and characterization of a metal semiconductor field effect transistor (MESFET) based on single crystal GaN. The GaN layer was deposited over sapphire substrate using low pressure metalorganic chemical vapor deposition. MESFET devices were fabricated on isolated mesas using TiAu for the source and drain ohmic contacts and silver for the gate Schottky. For devices with a gate length of 4 μm (channel opening, i.e., source to drain separation of 10 μm), a transconductance of 23 mS/mm was obtained at −1 V gate bias. Complete pinch-off was observed for a gate potential of −12 V.

Bibliography

Asif Khan, M., Kuznia, J. N., Bhattarai, A. R., & Olson, D. T. (1993). Metal semiconductor field effect transistor based on single crystal GaN. Applied Physics Letters, 62(15), 1786–1787.

Authors 4
  1. M. Asif Khan (first)
  2. J. N. Kuznia (additional)
  3. A. R. Bhattarai (additional)
  4. D. T. Olson (additional)
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Dates
Type When
Created 23 years ago (July 26, 2002, 9:34 a.m.)
Deposited 1 year, 6 months ago (Feb. 3, 2024, 12:23 a.m.)
Indexed 2 months ago (June 24, 2025, 7:28 a.m.)
Issued 32 years, 4 months ago (April 12, 1993)
Published 32 years, 4 months ago (April 12, 1993)
Published Print 32 years, 4 months ago (April 12, 1993)
Funders 0

None

@article{Asif_Khan_1993, title={Metal semiconductor field effect transistor based on single crystal GaN}, volume={62}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.109549}, DOI={10.1063/1.109549}, number={15}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Asif Khan, M. and Kuznia, J. N. and Bhattarai, A. R. and Olson, D. T.}, year={1993}, month=apr, pages={1786–1787} }