Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

The dependence of defect passivation in undoped polycrystalline silicon on hydrogenation conditions (i.e., time and temperature) was examined. At long hydrogenation times the spin density NS saturates. The saturation value of NS depends strongly on the hydrogenation temperature. The lowest residual spin density was obtained at 350 °C. Model calculations of the time and temperature dependence of the defect passivation suggest that the amount of hydrogen necessary for defect passivation exceeds the density of grain boundary defects by a factor that is significantly larger than unity and which depends on the hydrogenation temperature.

Bibliography

Nickel, N. H., Johnson, N. M., & Jackson, W. B. (1993). Hydrogen passivation of grain boundary defects in polycrystalline silicon thin films. Applied Physics Letters, 62(25), 3285–3287.

Authors 3
  1. N. H. Nickel (first)
  2. N. M. Johnson (additional)
  3. W. B. Jackson (additional)
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Dates
Type When
Created 23 years, 1 month ago (July 26, 2002, 9:36 a.m.)
Deposited 1 year, 7 months ago (Feb. 3, 2024, 12:47 a.m.)
Indexed 2 months, 2 weeks ago (June 18, 2025, 3:49 a.m.)
Issued 32 years, 2 months ago (June 21, 1993)
Published 32 years, 2 months ago (June 21, 1993)
Published Print 32 years, 2 months ago (June 21, 1993)
Funders 0

None

@article{Nickel_1993, title={Hydrogen passivation of grain boundary defects in polycrystalline silicon thin films}, volume={62}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.109101}, DOI={10.1063/1.109101}, number={25}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Nickel, N. H. and Johnson, N. M. and Jackson, W. B.}, year={1993}, month=jun, pages={3285–3287} }