Abstract
In this letter, a model for growth kinetics of ultrathin dielectrics obtained by oxidation of silicon in a nitrous oxide environment is proposed. The model assumes that the oxide growth is limited by time-dependent interface reaction, which is slowed down and eventually completely blocked as oxide growth sites are neutralized by nitrogen atoms. The model fits experimental data extremely well, both with time and temperature.
References
7
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 9:34 a.m.) |
Deposited | 1 year, 7 months ago (Feb. 3, 2024, 12:16 a.m.) |
Indexed | 1 year, 6 months ago (Feb. 7, 2024, 7:29 p.m.) |
Issued | 32 years, 5 months ago (March 29, 1993) |
Published | 32 years, 5 months ago (March 29, 1993) |
Published Print | 32 years, 5 months ago (March 29, 1993) |
@article{Dimitrijev_1993, title={Model for dielectric growth on silicon in a nitrous oxide environment}, volume={62}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.108633}, DOI={10.1063/1.108633}, number={13}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Dimitrijev, Sima and Sweatman, Denis and Harrison, H. Barry}, year={1993}, month=mar, pages={1539–1540} }