DOI: 10.1063/1.108233. Degradation and breakdown of silicon dioxide films on silicon

Degradation and breakdown of silicon dioxide films on silicon

10.1063/1.108233

Crossref journal-article

AIP Publishing

Applied Physics Letters (317)

Abstract

Destructive breakdown in silicon dioxide is shown to be strongly correlated to the oxide degradation caused by hot-electron-induced defect production and charge trapping near the interfaces of the films. Two well-defined transitions in the charge-to-breakdown data as a function of field and oxide thickness are shown to coincide with the onset of trap creation and impact ionization by electrons with energies exceeding 2 and 9 eV, respectively.

Bibliography

DiMaria, D. J., Arnold, D., & Cartier, E. (1992). Degradation and breakdown of silicon dioxide films on silicon. Applied Physics Letters, 61(19), 2329â2331.

Authors 3

D. J. DiMaria (first)
D. Arnold (additional)
E. Cartier (additional)

References 15 Referenced 88

10.1116/1.569344 / J. Vac. Sci. Technol. (1977)
10.1063/1.89252 / Appl. Phys. Lett. (1977)
10.1063/1.334518 / J. Appl. Phys. (1985)
10.1063/1.336098 / J. Appl. Phys. (1985)
10.1103/PhysRevB.31.8124 / Phys. Rev. B (1985)
{'key': '2024020304453009400_r6', 'first-page': '10', 'volume': '44', 'year': '1991', 'journal-title': 'Phys. Rev. B'} / Phys. Rev. B (1991)
10.1080/10420159108220618 / Radiat. Eff. Defects in Solids (1991)
10.1103/PhysRevB.45.1477 / Phys. Rev. B (1992)
10.1063/1.107081 / Appl. Phys. Lett. (1992)
10.1063/1.342824 / J. Appl. Phys. (1989)
10.1063/1.97563 / Appl. Phys. Lett. (1986)
{'key': '2024020304453009400_r12'}
{'key': '2024020304453009400_r13'}
{'key': '2024020304453009400_r14', 'first-page': '244', 'volume': '17', 'year': '1988', 'journal-title': 'Mikroelektronika'} / Mikroelektronika (1988)
10.1063/1.341727 / J. Appl. Phys. (1988)

Dates

Type	When
Created	23 years, 1 month ago (July 26, 2002, 9:34 a.m.)
Deposited	1 year, 6 months ago (Feb. 2, 2024, 11:45 p.m.)
Indexed	1 month, 3 weeks ago (July 4, 2025, 7:25 a.m.)
Issued	32 years, 9 months ago (Nov. 9, 1992)
Published	32 years, 9 months ago (Nov. 9, 1992)
Published Print	32 years, 9 months ago (Nov. 9, 1992)

Funders 0

None

BibTeX

@article{DiMaria_1992, title={Degradation and breakdown of silicon dioxide films on silicon}, volume={61}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.108233}, DOI={10.1063/1.108233}, number={19}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={DiMaria, D. J. and Arnold, D. and Cartier, E.}, year={1992}, month=nov, pages={2329–2331} }

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