DOI: 10.1063/1.107761. Nanometer patterning of InP using aerosol and plasma etching techniques

Nanometer patterning of InP using aerosol and plasma etching techniques

10.1063/1.107761

Crossref journal-article

AIP Publishing

Applied Physics Letters (317)

Abstract

By the application of aerosol techniques for the deposition of well-defined particles of silver in combination with methane-based electron cyclotron resonance plasma etching, we have been able to fabricate nanometer sized columns of InP. Silver particles are produced via homogeneous nucleation out of silver vapor saturated nitrogen gas from a tube furnace at around 1100 °C and, after size selection, deposited on the surface of InP. Scanning electron microscope images show that equally sized particles of silver, with an effective diameter in the range 20–40 nm, can be generated and deposited on the semiconductor. In a dry etching process applied subsequently we transfer vertically the feature of the particles into the InP material underneath producing free-standing columns of InP with diameters as small as 50 nm.

Bibliography

Wiedensohler, A., Hansson, H.-C., Maximov, I., & Samuelson, L. (1992). Nanometer patterning of InP using aerosol and plasma etching techniques. Applied Physics Letters, 61(7), 837â839.

Authors 4

Alfred Wiedensohler (first)
Hans-Christen Hansson (additional)
Ivan Maximov (additional)
Lars Samuelson (additional)

References 9 Referenced 30

{'key': '2024020304251054300_r1', 'volume': '254', 'year': '1991', 'journal-title': 'Science'} / Science (1991)
{'key': '2024020304251054300_r2'}
10.1016/0921-5107(91)90186-Y / Mater. Sci. Eng. B (1991)
{'key': '2024020304251054300_r4'}
{'key': '2024020304251054300_r4a', 'volume': '1676', 'journal-title': 'Proc. SPIE'} / Proc. SPIE
{'key': '2024020304251054300_r5', 'volume': '22', 'year': '1991', 'journal-title': 'J. Aerosol Sci.'} / J. Aerosol Sci. (1991)
10.1063/1.106471 / Appl. Phys. Lett. (1992)
10.1016/0021-8502(83)90035-6 / J. Aerosol Sci. (1983)
10.1080/02786829108959498 / J. Aerosol Sci. Techn. (1991)

Dates

Type	When
Created	23 years, 1 month ago (July 26, 2002, 9:34 a.m.)
Deposited	1 year, 6 months ago (Feb. 2, 2024, 11:25 p.m.)
Indexed	2 months ago (June 26, 2025, 6:45 a.m.)
Issued	33 years ago (Aug. 17, 1992)
Published	33 years ago (Aug. 17, 1992)
Published Print	33 years ago (Aug. 17, 1992)

Funders 0

None

BibTeX

@article{Wiedensohler_1992, title={Nanometer patterning of InP using aerosol and plasma etching techniques}, volume={61}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.107761}, DOI={10.1063/1.107761}, number={7}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Wiedensohler, Alfred and Hansson, Hans-Christen and Maximov, Ivan and Samuelson, Lars}, year={1992}, month=aug, pages={837–839} }

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