DOI: 10.1063/1.107304. Laser-assisted organometallic chemical vapor deposition of films of rhodium and iridium

Laser-assisted organometallic chemical vapor deposition of films of rhodium and iridium

10.1063/1.107304

Crossref journal-article

AIP Publishing

Applied Physics Letters (317)

Abstract

High purity (less than 1% carbon) thin films of rhodium and iridium metal have been obtained by laser-assisted organometallic chemical vapor deposition. Gaseous (η5-C5H5)M(C2H4)2 (M=Rh,Ir) was the organometallic precursor. Depositions were carried out in an atmosphere of He and H2 at room temperature and atmospheric pressure. Wavelength dependence studies of the rhodium precursor have shown that only irradiation into the compound’s charge transfer band causes deposition. Deposits can also be obtained thermally. The films were analyzed by x-ray diffraction and x-ray photoelectron spectroscopy.

Bibliography

Cohan, J. S., Yuan, H., Williams, R. S., & Zink, J. I. (1992). Laser-assisted organometallic chemical vapor deposition of films of rhodium and iridium. Applied Physics Letters, 60(11), 1402â1403.

Authors 4

Judson S. Cohan (first)
Haojie Yuan (additional)
R. Stanley Williams (additional)
Jeffrey I. Zink (additional)

References 14 Referenced 18

10.1103/PhysRevB.41.3353 / Phys. Rev. B (1990)
{'key': '2024020303470774900_r2', 'first-page': '527', 'volume': '14', 'year': '1990', 'journal-title': 'New J. Chem.'} / New J. Chem. (1990)
10.1039/jm9910100551 / J. Mater. Chem. (1991)
10.1063/1.100472 / Appl. Phys. Lett. (1988)
10.1021/ic50007a026 / Inorg. Chem. (1963)
10.1021/ja00181a025 / J. Am. Chem. Soc. (1990)
{'key': '2024020303470774900_r7', 'first-page': '14', 'volume': '15', 'year': '1967', 'journal-title': 'Inorg. Synth.'} / Inorg. Synth. (1967)
{'key': '2024020303470774900_r8', 'first-page': '2195', 'year': '1973', 'journal-title': 'J.C.S. Dalton'} / J.C.S. Dalton (1973)
10.1021/om00086a026 / Organometallics (1984)
{'key': '2024020303470774900_r10'}
{'key': '2024020303470774900_r10a'}
{'key': '2024020303470774900_r11'}
10.1021/om00097a013 / Organometallics (1988)
{'key': '2024020303470774900_r13', 'first-page': '1347', 'year': '1987', 'journal-title': 'J.C.S. Chem. Commun.'} / J.C.S. Chem. Commun. (1987)

Dates

Type	When
Created	23 years, 1 month ago (July 26, 2002, 9:33 a.m.)
Deposited	1 year, 6 months ago (Feb. 2, 2024, 10:47 p.m.)
Indexed	1 year, 6 months ago (Feb. 6, 2024, 5:44 a.m.)
Issued	33 years, 5 months ago (March 16, 1992)
Published	33 years, 5 months ago (March 16, 1992)
Published Print	33 years, 5 months ago (March 16, 1992)

Funders 0

None

BibTeX

@article{Cohan_1992, title={Laser-assisted organometallic chemical vapor deposition of films of rhodium and iridium}, volume={60}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.107304}, DOI={10.1063/1.107304}, number={11}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Cohan, Judson S. and Yuan, Haojie and Williams, R. Stanley and Zink, Jeffrey I.}, year={1992}, month=mar, pages={1402–1403} }

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