Abstract
A study of the luminescence properties of epitaxial GaP containing atomic N grown by molecular beam epitaxy using NH3 and PH3 as the column V sources was conducted. The 77 K photoluminescence spectra of the N-doped epitaxial GaP showed a continuous redshift, from 5691 Å (2.18 eV) to 6600 Å (1.88 eV), resulted when the N concentration exceeded ∼5–7×1019 cm−3. This energy shift was found to be consistent with energy gap predictions using the dielectric theory of electronegativity for the GaP1−xNx system. The data also indicate that the emission intensity was maximum for N∼1×1020 cm−3, and then monotonically decreases with increasing N content. This is consistent with the formation of an indirect band-gap semiconductor.
References
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 9:33 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 2, 2024, 11 p.m.) |
Indexed | 11 months, 2 weeks ago (Sept. 19, 2024, 10:52 a.m.) |
Issued | 33 years, 3 months ago (May 18, 1992) |
Published | 33 years, 3 months ago (May 18, 1992) |
Published Print | 33 years, 3 months ago (May 18, 1992) |
@article{Baillargeon_1992, title={Luminescence quenching and the formation of the GaP1−xNx alloy in GaP with increasing nitrogen content}, volume={60}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.106906}, DOI={10.1063/1.106906}, number={20}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Baillargeon, J. N. and Cheng, K. Y. and Hofler, G. E. and Pearah, P. J. and Hsieh, K. C.}, year={1992}, month=may, pages={2540–2542} }