Abstract
Characterization of light-emitting porous Si films with x-ray photoelectron spectroscopy is reported. Only traces of O are detected on HF-etched samples, in contradiction to an earlier report that oxides are a significant component of porous Si. Si 2p and valence-band measurements demonstrate that the near-surface region of high porosity films which exhibit visible luminescence consists of amorphous Si.
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 9:34 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 2, 2024, 10:37 p.m.) |
Indexed | 1 year, 6 months ago (Feb. 19, 2024, 2:05 p.m.) |
Issued | 33 years, 6 months ago (Feb. 24, 1992) |
Published | 33 years, 6 months ago (Feb. 24, 1992) |
Published Print | 33 years, 6 months ago (Feb. 24, 1992) |
@article{Vasquez_1992, title={Electronic structure of light-emitting porous Si}, volume={60}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.106503}, DOI={10.1063/1.106503}, number={8}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Vasquez, R. P. and Fathauer, R. W. and George, T. and Ksendzov, A. and Lin, T. L.}, year={1992}, month=feb, pages={1004–1006} }