Abstract
A novel approach to producing p-type ZnSe epitaxial layers is reported which involves nitrogen atom beam doping during molecular beam epitaxial growth. Net acceptor concentrations as large as 3.4×1017 cm−3 have been measured in nitrogen atom beam doped ZnSe/GaAs heteroepitaxial layers which represents the highest acceptor concentration reported to date for ZnSe:N epitaxial material grown by molecular beam epitaxy. In addition, light-emitting diodes based on ZnSe:N/ZnSe:Cl, p-n homojunctions have been found to exhibit dominant electroluminescence in the blue region of the visible spectrum at room temperature.
References
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Dates
Type | When |
---|---|
Created | 23 years ago (July 26, 2002, 9:05 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 2, 2024, 8:39 p.m.) |
Indexed | 1 month, 1 week ago (July 12, 2025, 6:48 p.m.) |
Issued | 34 years, 9 months ago (Nov. 12, 1990) |
Published | 34 years, 9 months ago (Nov. 12, 1990) |
Published Print | 34 years, 9 months ago (Nov. 12, 1990) |
@article{Park_1990, title={p-type ZnSe by nitrogen atom beam doping during molecular beam epitaxial growth}, volume={57}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.103919}, DOI={10.1063/1.103919}, number={20}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Park, R. M. and Troffer, M. B. and Rouleau, C. M. and DePuydt, J. M. and Haase, M. A.}, year={1990}, month=nov, pages={2127–2129} }