DOI: 10.1063/1.103237. Microstructure of epitaxial YBa2Cu3O7−<i>x</i> thin films

Microstructure of epitaxial YBa2Cu3O7−x thin films

10.1063/1.103237

Crossref journal-article

AIP Publishing

Applied Physics Letters (317)

Abstract

We have investigated the microstructure of epitaxial YBa2Cu3O7−x thin films on SrTiO3(100), LaGaO3(100), and LaAlO3 (100) with particular emphasis on how the final microstructure is developed. Cross-sectional transmission electron microscopy as well as plan-view transmission electron microscopy combined with sputter depth profiling were used to study the change in microstructure with the increase in film thickness. For a thin film or near the substrate/film interface of a thick film, the YBa2Cu3O7−x film is composed primarily of grains oriented with c axis normal to the substrate surface and a small volume fraction of grains with c axis parallel to the substrate surface. As the film grows thicker, the c-axis parallel grains increase in size and grow over the top of the c-axis normal grains. The volume fraction of c-axis parallel grains increases rapidly as the film thickness increases and eventually the entire film surface is covered by c-axis parallel grains. However, the number density of the c-axis parallel grains remains constant throughout the whole film thickness. A growth model is proposed to explain the observed microstructure. Based on this model, a computer simulation is carried out. The simulated microstructure agrees well with the experimental result.

Bibliography

Nieh, C. W., Anthony, L., Josefowicz, J. Y., & Krajenbrink, F. G. (1990). Microstructure of epitaxial YBa2Cu3O7âx thin films. Applied Physics Letters, 56(21), 2138â2140.

Authors 4

C. W. Nieh (first)
L. Anthony (additional)
J. Y. Josefowicz (additional)
F. G. Krajenbrink (additional)

References 8 Referenced 68

10.1063/1.98513 / Appl. Phys. Lett. (1987)
10.1063/1.100585 / Appl. Phys. Lett. (1988)
10.1063/1.102436 / Appl. Phys. Lett. (1989)
10.1063/1.99302 / Appl. Phys. Lett. (1988)
10.1103/PhysRevB.39.12355 / Phys. Rev. B (1989)
10.1063/1.343222 / J. Appl. Phys. (1989)
10.1063/1.101562 / Appl. Phys. Lett. (1989)
10.1063/1.100484 / Appl. Phys. Lett. (1988)

Dates

Type	When
Created	23 years, 1 month ago (July 26, 2002, 8:51 a.m.)
Deposited	1 year, 6 months ago (Feb. 2, 2024, 7:59 p.m.)
Indexed	1 year, 6 months ago (Feb. 4, 2024, 11:43 a.m.)
Issued	35 years, 3 months ago (May 21, 1990)
Published	35 years, 3 months ago (May 21, 1990)
Published Print	35 years, 3 months ago (May 21, 1990)

Funders 0

None

BibTeX

@article{Nieh_1990, title={Microstructure of epitaxial YBa2Cu3O7−x thin films}, volume={56}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.103237}, DOI={10.1063/1.103237}, number={21}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Nieh, C. W. and Anthony, L. and Josefowicz, J. Y. and Krajenbrink, F. G.}, year={1990}, month=may, pages={2138–2140} }

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