Abstract
Electron emitters in vacuum microelectronic devices need sharp tips in order to permit electron emission at moderate voltages. A method has been found for preparing uniform silicon tips with a radius of curvature less than 1 nm. These tips are formed by oxidation of 5-μm-high silicon cones through exploitation of a known oxidation inhibition of silicon at regions of high curvature.
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 8:51 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 2, 2024, 7:33 p.m.) |
Indexed | 2 months, 2 weeks ago (June 17, 2025, 5:46 a.m.) |
Issued | 35 years, 7 months ago (Jan. 15, 1990) |
Published | 35 years, 7 months ago (Jan. 15, 1990) |
Published Print | 35 years, 7 months ago (Jan. 15, 1990) |
@article{Marcus_1990, title={Formation of silicon tips with <1 nm radius}, volume={56}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.102841}, DOI={10.1063/1.102841}, number={3}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Marcus, R. B. and Ravi, T. S. and Gmitter, T. and Chin, K. and Liu, D. and Orvis, W. J. and Ciarlo, D. R. and Hunt, C. E. and Trujillo, J.}, year={1990}, month=jan, pages={236–238} }