DOI: 10.1039/c2nr11875k. Atomic layer deposition for nanofabrication and interface engineering

Atomic layer deposition for nanofabrication and interface engineering

10.1039/c2nr11875k

Crossref journal-article

Royal Society of Chemistry (RSC)

Nanoscale (292)

Bibliography

Liu, M., Li, X., Karuturi, S. K., Tok, A. I. Y., & Fan, H. J. (2012). Atomic layer deposition for nanofabrication and interface engineering. Nanoscale, 4(5), 1522.

Authors 5

Monan Liu (first)
Xianglin Li (additional)
Siva Krishna Karuturi (additional)
Alfred Iing Yoong Tok (additional)
Hong Jin Fan (additional)

References 43 Referenced 85

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Dates

Type	When
Created	13 years, 7 months ago (Jan. 6, 2012, 12:34 a.m.)
Deposited	1 year, 4 months ago (April 17, 2024, 11:18 a.m.)
Indexed	4 days, 19 hours ago (Aug. 19, 2025, 6:57 a.m.)
Issued	13 years, 7 months ago (Jan. 1, 2012)
Published	13 years, 7 months ago (Jan. 1, 2012)
Published Print	13 years, 7 months ago (Jan. 1, 2012)

Funders 0

None

BibTeX

@article{Liu_2012, title={Atomic layer deposition for nanofabrication and interface engineering}, volume={4}, ISSN={2040-3372}, url={http://dx.doi.org/10.1039/c2nr11875k}, DOI={10.1039/c2nr11875k}, number={5}, journal={Nanoscale}, publisher={Royal Society of Chemistry (RSC)}, author={Liu, Monan and Li, Xianglin and Karuturi, Siva Krishna and Tok, Alfred Iing Yoong and Fan, Hong Jin}, year={2012}, pages={1522} }

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