DOI: 10.1039/c0jm01228a. Electrochemical deposition of copper oxide nanowires for photoelectrochemical applications

Electrochemical deposition of copper oxide nanowires for photoelectrochemical applications

10.1039/c0jm01228a

Crossref journal-article

Royal Society of Chemistry (RSC)

Journal of Materials Chemistry (292)

Bibliography

Chen, L., Shet, S., Tang, H., Wang, H., Deutsch, T., Yan, Y., Turner, J., & Al-Jassim, M. (2010). Electrochemical deposition of copper oxide nanowires for photoelectrochemical applications. Journal of Materials Chemistry, 20(33), 6962.

Authors 8

Le Chen (first)
Sudhakar Shet (additional)
Houwen Tang (additional)
Heli Wang (additional)
Todd Deutsch (additional)
Yanfa Yan (additional)
John Turner (additional)
Mowafak Al-Jassim (additional)

References 26 Referenced 91

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Dates

Type	When
Created	15 years, 1 month ago (July 9, 2010, 10 a.m.)
Deposited	1 year, 4 months ago (April 17, 2024, 10:56 a.m.)
Indexed	1 year ago (Aug. 30, 2024, 1:18 p.m.)
Issued	15 years, 8 months ago (Jan. 1, 2010)
Published	15 years, 8 months ago (Jan. 1, 2010)
Published Print	15 years, 8 months ago (Jan. 1, 2010)

Funders 0

None

BibTeX

@article{Chen_2010, title={Electrochemical deposition of copper oxide nanowires for photoelectrochemical applications}, volume={20}, ISSN={1364-5501}, url={http://dx.doi.org/10.1039/c0jm01228a}, DOI={10.1039/c0jm01228a}, number={33}, journal={Journal of Materials Chemistry}, publisher={Royal Society of Chemistry (RSC)}, author={Chen, Le and Shet, Sudhakar and Tang, Houwen and Wang, Heli and Deutsch, Todd and Yan, Yanfa and Turner, John and Al-Jassim, Mowafak}, year={2010}, pages={6962} }

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