DOI: 10.1039/b901135h. Improved photoelectrochemical performance of Ti-doped α-Fe2O3 thin films by surface modification with fluoride

Improved photoelectrochemical performance of Ti-doped α-Fe2O3 thin films by surface modification with fluoride

10.1039/b901135h

Crossref journal-article

Royal Society of Chemistry (RSC)

Chemical Communications (292)

Bibliography

Hu, Y.-S., Kleiman-Shwarsctein, A., Stucky, G. D., & McFarland, E. W. (2009). Improved photoelectrochemical performance of Ti-doped Î±-Fe2O3 thin films by surface modification with fluoride. Chemical Communications, 19, 2652.

Authors 4

Yong-Sheng Hu (first)
Alan Kleiman-Shwarsctein (additional)
Galen D. Stucky (additional)
Eric W. McFarland (additional)

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Dates

Type	When
Created	16 years, 5 months ago (March 19, 2009, 11:30 a.m.)
Deposited	1 year, 4 months ago (April 17, 2024, 8:12 a.m.)
Indexed	5 days, 19 hours ago (Aug. 27, 2025, 11:56 a.m.)
Issued	16 years, 8 months ago (Jan. 1, 2009)
Published	16 years, 8 months ago (Jan. 1, 2009)
Published Print	16 years, 8 months ago (Jan. 1, 2009)

Funders 0

None

BibTeX

@article{Hu_2009, title={Improved photoelectrochemical performance of Ti-doped α-Fe2O3 thin films by surface modification with fluoride}, ISSN={1364-548X}, url={http://dx.doi.org/10.1039/b901135h}, DOI={10.1039/b901135h}, number={19}, journal={Chemical Communications}, publisher={Royal Society of Chemistry (RSC)}, author={Hu, Yong-Sheng and Kleiman-Shwarsctein, Alan and Stucky, Galen D. and McFarland, Eric W.}, year={2009}, pages={2652} }

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