DOI: 10.1039/c4nr02451f. Atomic layer deposition of a MoS<sub>2</sub>film

10.1039/c4nr02451f

Crossref journal-article

Royal Society of Chemistry (RSC)

Nanoscale (292)

Abstract

A mono- to multilayer thick MoS2film has been grown by using the atomic layer deposition (ALD) technique on a sapphire wafer.

Bibliography

Tan, L. K., Liu, B., Teng, J. H., Guo, S., Low, H. Y., & Loh, K. P. (2014). Atomic layer deposition of a MoS2film. Nanoscale, 6(18), 10584â10588.

Authors 6

Lee Kheng Tan (first)
Bo Liu (additional)
Jing Hua Teng (additional)
Shifeng Guo (additional)
Hong Yee Low (additional)
Kian Ping Loh (additional)

References 40 Referenced 378

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Dates

Type	When
Created	11 years, 1 month ago (July 3, 2014, 5:12 a.m.)
Deposited	1 year, 4 months ago (April 17, 2024, 12:25 p.m.)
Indexed	46 minutes ago (Aug. 29, 2025, 3:47 p.m.)
Issued	11 years, 7 months ago (Jan. 1, 2014)
Published	11 years, 7 months ago (Jan. 1, 2014)
Published Online	11 years, 7 months ago (Jan. 1, 2014)

Funders 0

None

BibTeX

@article{Tan_2014, title={Atomic layer deposition of a MoS2film}, volume={6}, ISSN={2040-3372}, url={http://dx.doi.org/10.1039/c4nr02451f}, DOI={10.1039/c4nr02451f}, number={18}, journal={Nanoscale}, publisher={Royal Society of Chemistry (RSC)}, author={Tan, Lee Kheng and Liu, Bo and Teng, Jing Hua and Guo, Shifeng and Low, Hong Yee and Loh, Kian Ping}, year={2014}, pages={10584–10588} }

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  "relation": {},
  "ISSN": [
    "2040-3364",
    "2040-3372"
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  "subject": [],
  "container-title-short": "Nanoscale",
  "published": {
    "date-parts": [
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        2014
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    ]
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    {
      "value": "Received 6 May 2014; Accepted 30 June 2014; Accepted Manuscript published 3 July 2014; Advance Article published 29 July 2014; Version of Record published 21 August 2014",
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