Top-down fabricated silicon nanowires under tensile elastic strain up to 4.5%
10.1038/ncomms2102
Crossref journal-article
Springer Science and Business Media LLC
Nature Communications (297)
Bibliography

Minamisawa, R. A., Süess, M. J., Spolenak, R., Faist, J., David, C., Gobrecht, J., Bourdelle, K. K., & Sigg, H. (2012). Top-down fabricated silicon nanowires under tensile elastic strain up to 4.5%. Nature Communications, 3(1).

Authors 8
  1. R.A. Minamisawa (first)
  2. M.J. Süess (additional)
  3. R. Spolenak (additional)
  4. J. Faist (additional)
  5. C. David (additional)
  6. J. Gobrecht (additional)
  7. K.K. Bourdelle (additional)
  8. H. Sigg (additional)
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Dates
Type When
Created 12 years, 11 months ago (Oct. 1, 2012, 12:23 p.m.)
Deposited 2 years, 7 months ago (Jan. 5, 2023, 7:23 p.m.)
Indexed 3 months, 1 week ago (May 23, 2025, 4:11 a.m.)
Issued 12 years, 11 months ago (Oct. 2, 2012)
Published 12 years, 11 months ago (Oct. 2, 2012)
Published Online 12 years, 11 months ago (Oct. 2, 2012)
Funders 0

None

@article{Minamisawa_2012, title={Top-down fabricated silicon nanowires under tensile elastic strain up to 4.5%}, volume={3}, ISSN={2041-1723}, url={http://dx.doi.org/10.1038/ncomms2102}, DOI={10.1038/ncomms2102}, number={1}, journal={Nature Communications}, publisher={Springer Science and Business Media LLC}, author={Minamisawa, R.A. and Süess, M.J. and Spolenak, R. and Faist, J. and David, C. and Gobrecht, J. and Bourdelle, K.K. and Sigg, H.}, year={2012}, month=oct }