Crossref journal-article
American Chemical Society (ACS)
ACS Nano (316)
Bibliography

Kalbac, M., Reina-Cecco, A., Farhat, H., Kong, J., Kavan, L., & Dresselhaus, M. S. (2010). The Influence of Strong Electron and Hole Doping on the Raman Intensity of Chemical Vapor-Deposition Graphene. ACS Nano, 4(10), 6055–6063.

Authors 6
  1. Martin Kalbac (first)
  2. Alfonso Reina-Cecco (additional)
  3. Hootan Farhat (additional)
  4. Jing Kong (additional)
  5. Ladislav Kavan (additional)
  6. Mildred S. Dresselhaus (additional)
References 23 Referenced 247
  1. 10.1021/nl902362q / Nano Lett. by Jung N. (2009)
  2. 10.1038/nnano.2008.67 / Nat. Nanotechnol. by Das A. (2008)
  3. 10.1103/PhysRevB.80.165413 / Phys. Rev. B by Basko D. M. (2009)
  4. 10.1021/nl803883h / Nano Lett. by Freitag M. (2009)
  5. 10.1016/j.physrep.2009.02.003 / Phys. Rep. by Malard L. M. (2009)
  6. 10.1103/PhysRevLett.98.166802 / Phys. Rev. Lett. by Yan J. (2007)
  7. 10.1103/PhysRevLett.98.019701 / Phys. Rev. Lett. by Kavan L. (2007)
  8. 10.1103/PhysRevLett.97.187401 / Phys. Rev. Lett. by Ferrari A. C. (2006)
  9. 10.1103/PhysRevLett.85.5214 / Phys. Rev. Lett. by Thomsen C. (2000)
  10. 10.1038/nature04233 / Nature by Novoselov K. S. (2005)
  11. 10.1038/nnano.2008.215 / Nat. Nanotechnol. by Hernandez Y. (2008)
  12. 10.1021/nl801827v / Nano Lett. by Reina A. (2009)
  13. 10.1103/PhysRevB.79.155417 / Phys. Rev. B by Das A. (2009)
  14. 10.1016/j.diamond.2009.01.017 / Diamond Relat. Mater. by Kalbac M. (2009)
  15. 10.1103/PhysRevB.78.113407 / Phys. Rev. B by Poncharal P. (2008)
  16. 10.1103/PhysRevLett.97.266407 / Phys. Rev. Lett. by Lazzeri M. (2006)
  17. 10.1103/PhysRevLett.93.185503 / Phys. Rev. Lett. by Piscanec S. (2004)
  18. 10.1021/nn9004318 / ACS Nano by Kalbac M (2009)
  19. 10.1021/jp805612d / J. Phys. Chem. C by Kalbac M. (2008)
  20. 10.1021/jp905312b / J. Phys. Chem. C by Kalbac M (2009)
  21. 10.1103/PhysRevB.75.035427 / Phys. Rev. B by Piscanec S. (2007)
  22. 10.1088/1367-2630/11/9/095011 / New. J. Phys. by Basko D. M. (2009)
  23. 10.1002/pssr.200903135 / Phys. Status Solidi R by Casiraghi C. (2009)
Dates
Type When
Created 14 years, 10 months ago (Oct. 8, 2010, 1:12 p.m.)
Deposited 2 years, 4 months ago (April 7, 2023, 5:28 p.m.)
Indexed 3 days, 1 hour ago (Aug. 27, 2025, 12:28 p.m.)
Issued 14 years, 10 months ago (Oct. 8, 2010)
Published 14 years, 10 months ago (Oct. 8, 2010)
Published Online 14 years, 10 months ago (Oct. 8, 2010)
Published Print 14 years, 10 months ago (Oct. 26, 2010)
Funders 0

None

@article{Kalbac_2010, title={The Influence of Strong Electron and Hole Doping on the Raman Intensity of Chemical Vapor-Deposition Graphene}, volume={4}, ISSN={1936-086X}, url={http://dx.doi.org/10.1021/nn1010914}, DOI={10.1021/nn1010914}, number={10}, journal={ACS Nano}, publisher={American Chemical Society (ACS)}, author={Kalbac, Martin and Reina-Cecco, Alfonso and Farhat, Hootan and Kong, Jing and Kavan, Ladislav and Dresselhaus, Mildred S.}, year={2010}, month=oct, pages={6055–6063} }