DOI: 10.1021/la00060a047. Electrochemical and ultrahigh vacuum characterization of ultrathin copper films on platinum(111)

Electrochemical and ultrahigh vacuum characterization of ultrathin copper films on platinum(111)

10.1021/la00060a047

Crossref journal-article

American Chemical Society (ACS)

Langmuir (316)

Bibliography

Leung, L. W. H., Gregg, T. W., & Goodman, D. W. (1991). Electrochemical and ultrahigh vacuum characterization of ultrathin copper films on platinum(111). Langmuir, 7(12), 3205â3210.

Authors 3

Lam Wing H. Leung (first)
Thomas W. Gregg (additional)
D. Wayne Goodman (additional)

References 0 Referenced 31

None

Dates

Type	When
Created	20 years, 5 months ago (March 14, 2005, 10:12 p.m.)
Deposited	2 years, 5 months ago (March 22, 2023, 8:07 a.m.)
Indexed	2 days, 8 hours ago (Sept. 3, 2025, 7:05 a.m.)
Issued	33 years, 9 months ago (Dec. 1, 1991)
Published	33 years, 9 months ago (Dec. 1, 1991)
Published Online	23 years, 4 months ago (May 1, 2002)
Published Print	33 years, 9 months ago (Dec. 1, 1991)

Funders 0

None

BibTeX

@article{Leung_1991, title={Electrochemical and ultrahigh vacuum characterization of ultrathin copper films on platinum(111)}, volume={7}, ISSN={1520-5827}, url={http://dx.doi.org/10.1021/la00060a047}, DOI={10.1021/la00060a047}, number={12}, journal={Langmuir}, publisher={American Chemical Society (ACS)}, author={Leung, Lam Wing H. and Gregg, Thomas W. and Goodman, D. Wayne}, year={1991}, month=dec, pages={3205–3210} }

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