DOI: 10.1021/jp053042o. Evolution of the Adsorbed Water Layer Structure on Silicon Oxide at Room Temperature

Evolution of the Adsorbed Water Layer Structure on Silicon Oxide at Room Temperature

10.1021/jp053042o

Crossref journal-article

American Chemical Society (ACS)

The Journal of Physical Chemistry B (316)

Bibliography

Asay, D. B., & Kim, S. H. (2005). Evolution of the Adsorbed Water Layer Structure on Silicon Oxide at Room Temperature. The Journal of Physical Chemistry B, 109(35), 16760â16763.

Authors 2

David B. Asay (first)
Seong H. Kim (additional)

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Dates

Type	When
Created	19 years, 11 months ago (Sept. 1, 2005, 1 a.m.)
Deposited	2 years, 5 months ago (March 13, 2023, 2:02 a.m.)
Indexed	1 day, 18 hours ago (Aug. 21, 2025, 1:06 p.m.)
Issued	20 years ago (Aug. 13, 2005)
Published	20 years ago (Aug. 13, 2005)
Published Online	20 years ago (Aug. 13, 2005)
Published Print	19 years, 11 months ago (Sept. 1, 2005)

Funders 0

None

BibTeX

@article{Asay_2005, title={Evolution of the Adsorbed Water Layer Structure on Silicon Oxide at Room Temperature}, volume={109}, ISSN={1520-5207}, url={http://dx.doi.org/10.1021/jp053042o}, DOI={10.1021/jp053042o}, number={35}, journal={The Journal of Physical Chemistry B}, publisher={American Chemical Society (ACS)}, author={Asay, David B. and Kim, Seong H.}, year={2005}, month=aug, pages={16760–16763} }

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