DOI: 10.1021/ja8023059. Atomic Layer Deposition of Metal Oxides on Pristine and Functionalized Graphene

Atomic Layer Deposition of Metal Oxides on Pristine and Functionalized Graphene

10.1021/ja8023059

Crossref journal-article

American Chemical Society (ACS)

Journal of the American Chemical Society (316)

Bibliography

Wang, X., Tabakman, S. M., & Dai, H. (2008). Atomic Layer Deposition of Metal Oxides on Pristine and Functionalized Graphene. Journal of the American Chemical Society, 130(26), 8152â8153.

Authors 3

Xinran Wang (first)
Scott M. Tabakman (additional)
Hongjie Dai (additional)

References 14 Referenced 638

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10.1063/1.365238 / J. Appl. Phys. by Ostrick J. R. (1997)

Dates

Type	When
Created	17 years, 3 months ago (June 5, 2008, 4 a.m.)
Deposited	3 years, 10 months ago (Oct. 17, 2021, 11:13 a.m.)
Indexed	4 days, 7 hours ago (Sept. 3, 2025, 6:06 a.m.)
Issued	17 years, 3 months ago (June 5, 2008)
Published	17 years, 3 months ago (June 5, 2008)
Published Online	17 years, 3 months ago (June 5, 2008)
Published Print	17 years, 2 months ago (July 1, 2008)

Funders 0

None

BibTeX

@article{Wang_2008, title={Atomic Layer Deposition of Metal Oxides on Pristine and Functionalized Graphene}, volume={130}, ISSN={1520-5126}, url={http://dx.doi.org/10.1021/ja8023059}, DOI={10.1021/ja8023059}, number={26}, journal={Journal of the American Chemical Society}, publisher={American Chemical Society (ACS)}, author={Wang, Xinran and Tabakman, Scott M. and Dai, Hongjie}, year={2008}, month=jun, pages={8152–8153} }

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