DOI: 10.1021/j150567a010. Kinetics of the Oxidation and Nitridation of Silicon at High Temperatures

Kinetics of the Oxidation and Nitridation of Silicon at High Temperatures

10.1021/j150567a010

Crossref journal-article

American Chemical Society (ACS)

The Journal of Physical Chemistry (316)

Bibliography

Evans, J. W., & Chatterji, S. K. (1958). Kinetics of the Oxidation and Nitridation of Silicon at High Temperatures. The Journal of Physical Chemistry, 62(9), 1064â1067.

Authors 2

J. W. Evans (first)
S. K. Chatterji (additional)

References 0 Referenced 48

None

Dates

Type	When
Created	20 years, 5 months ago (March 14, 2005, 2:22 p.m.)
Deposited	2 years, 4 months ago (April 15, 2023, 12:38 p.m.)
Indexed	1 year, 6 months ago (Feb. 8, 2024, 4:22 p.m.)
Issued	67 years ago (Sept. 1, 1958)
Published	67 years ago (Sept. 1, 1958)
Published Online	23 years, 4 months ago (May 1, 2002)
Published Print	67 years ago (Sept. 1, 1958)

Funders 0

None

BibTeX

@article{Evans_1958, title={Kinetics of the Oxidation and Nitridation of Silicon at High Temperatures}, volume={62}, ISSN={1541-5740}, url={http://dx.doi.org/10.1021/j150567a010}, DOI={10.1021/j150567a010}, number={9}, journal={The Journal of Physical Chemistry}, publisher={American Chemical Society (ACS)}, author={Evans, J. W. and Chatterji, S. K.}, year={1958}, month=sep, pages={1064–1067} }

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