DOI: 10.1021/cm9902467. Supercritical CO<sub>2</sub> Processing for Submicron Imaging of Fluoropolymers

Supercritical CO2 Processing for Submicron Imaging of Fluoropolymers

10.1021/cm9902467

Crossref journal-article

American Chemical Society (ACS)

Chemistry of Materials (316)

Bibliography

Sundararajan, N., Yang, S., Ogino, K., Valiyaveettil, S., Wang, Zhou, X., Ober, C. K., Obendorf, S. K., & Allen, R. D. (1999). Supercritical CO2 Processing for Submicron Imaging of Fluoropolymers. Chemistry of Materials, 12(1), 41â48.

Authors 9

Narayan Sundararajan (first)
Shu Yang (additional)
Kenji Ogino (additional)
Suresh Valiyaveettil (additional)
Wang (additional)
Xinyi Zhou (additional)
Christopher K. Ober (additional)
Sharon K. Obendorf (additional)
Robert D. Allen (additional)

References 35 Referenced 78

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Dates

Type	When
Created	23 years, 1 month ago (July 26, 2002, 1:54 a.m.)
Deposited	3 years, 10 months ago (Oct. 13, 2021, 11:52 p.m.)
Indexed	1 week, 5 days ago (Aug. 21, 2025, 1:02 p.m.)
Issued	25 years, 8 months ago (Dec. 20, 1999)
Published	25 years, 8 months ago (Dec. 20, 1999)
Published Online	25 years, 8 months ago (Dec. 20, 1999)
Published Print	25 years, 8 months ago (Jan. 1, 2000)

Funders 0

None

BibTeX

@article{Sundararajan_1999, title={Supercritical CO2 Processing for Submicron Imaging of Fluoropolymers}, volume={12}, ISSN={1520-5002}, url={http://dx.doi.org/10.1021/cm9902467}, DOI={10.1021/cm9902467}, number={1}, journal={Chemistry of Materials}, publisher={American Chemical Society (ACS)}, author={Sundararajan, Narayan and Yang, Shu and Ogino, Kenji and Valiyaveettil, Suresh and Wang and Zhou, Xinyi and Ober, Christopher K. and Obendorf, Sharon K. and Allen, Robert D.}, year={1999}, month=dec, pages={41–48} }

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