DOI: 10.1021/cm00036a008. Chemical vapor deposition of ruthenium and osmium thin films using (hexafluoro-2-butyne)tetracarbonylruthenium and -osmium

Chemical vapor deposition of ruthenium and osmium thin films using (hexafluoro-2-butyne)tetracarbonylruthenium and -osmium

10.1021/cm00036a008

Crossref journal-article

American Chemical Society (ACS)

Chemistry of Materials (316)

Bibliography

Senzaki, Y., Gladfelter, W. L., & McCormick, F. B. (1993). Chemical vapor deposition of ruthenium and osmium thin films using (hexafluoro-2-butyne)tetracarbonylruthenium and -osmium. Chemistry of Materials, 5(12), 1715â1721.

Authors 3

Yoshihide Senzaki (first)
Wayne L. Gladfelter (additional)
Fred B. McCormick (additional)

References 0 Referenced 32

None

Dates

Type	When
Created	20 years, 5 months ago (March 8, 2005, 7:27 a.m.)
Deposited	2 years, 4 months ago (April 5, 2023, 1:12 a.m.)
Indexed	1 year, 1 month ago (July 19, 2024, 6:32 a.m.)
Issued	31 years, 8 months ago (Dec. 1, 1993)
Published	31 years, 8 months ago (Dec. 1, 1993)
Published Online	23 years, 3 months ago (May 1, 2002)
Published Print	31 years, 8 months ago (Dec. 1, 1993)

Funders 0

None

BibTeX

@article{Senzaki_1993, title={Chemical vapor deposition of ruthenium and osmium thin films using (hexafluoro-2-butyne)tetracarbonylruthenium and -osmium}, volume={5}, ISSN={1520-5002}, url={http://dx.doi.org/10.1021/cm00036a008}, DOI={10.1021/cm00036a008}, number={12}, journal={Chemistry of Materials}, publisher={American Chemical Society (ACS)}, author={Senzaki, Yoshihide and Gladfelter, Wayne L. and McCormick, Fred B.}, year={1993}, month=dec, pages={1715–1721} }

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