DOI: 10.1021/cm00019a032. Organometallic chemical vapor deposition of platinum. Reaction kinetics and vapor pressures of precursors

Organometallic chemical vapor deposition of platinum. Reaction kinetics and vapor pressures of precursors

10.1021/cm00019a032

Crossref journal-article

American Chemical Society (ACS)

Chemistry of Materials (316)

Bibliography

Xue, Z., Thridandam, H., Kaesz, H. D., & Hicks, R. F. (1992). Organometallic chemical vapor deposition of platinum. Reaction kinetics and vapor pressures of precursors. Chemistry of Materials, 4(1), 162â166.

Authors 4

Ziling Xue (first)
Hareesh Thridandam (additional)
Herbert D. Kaesz (additional)
Robert F. Hicks (additional)

References 0 Referenced 94

None

Dates

Type	When
Created	20 years, 5 months ago (March 8, 2005, 7:20 a.m.)
Deposited	2 years, 5 months ago (March 22, 2023, 4:45 a.m.)
Indexed	2 weeks, 6 days ago (Aug. 5, 2025, 8:24 a.m.)
Issued	33 years, 7 months ago (Jan. 1, 1992)
Published	33 years, 7 months ago (Jan. 1, 1992)
Published Online	23 years, 3 months ago (May 1, 2002)
Published Print	33 years, 7 months ago (Jan. 1, 1992)

Funders 0

None

BibTeX

@article{Xue_1992, title={Organometallic chemical vapor deposition of platinum. Reaction kinetics and vapor pressures of precursors}, volume={4}, ISSN={1520-5002}, url={http://dx.doi.org/10.1021/cm00019a032}, DOI={10.1021/cm00019a032}, number={1}, journal={Chemistry of Materials}, publisher={American Chemical Society (ACS)}, author={Xue, Ziling and Thridandam, Hareesh and Kaesz, Herbert D. and Hicks, Robert F.}, year={1992}, month=jan, pages={162–166} }

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